High Aspect Ratio Structures Research Articles

Lanthanum doped hafnium oxide thin films deposited on a lateral high aspect ratio structure using atomic layer deposition: A comparative study of surface composition and uniformity using x-ray photoelectron spectroscopy and time-of-flight secondary ion mass spectrometry

Hafnium oxide (HfO2) thin films doped with lanthanum (La) can achieve ferroelectricity, making the material applicable in transistor and memory technologies. To downscale future devices in the semiconductor industry, the application of the doped HfO2 material requires deposition on complex microscopic three-dimensional (3D) structures. A widely used process for the preparation of doped HfO2 thin films is atomic layer deposition (ALD). With 3D geometries, it is challenging to deposit materials homogeneously and to effectively characterize them. To forego the difficulties in film characterization, two-dimensional (2D) PillarHall lateral high aspect ratio (LHAR) test structures are used. These structures expose a lateral surface to facilitate the conformality analysis of thin films deposited using two different ALD processes. In this work, we aim to further advance the arsenal of analysis techniques used to characterize La doped HfO2 thin films by using x-ray photoelectron spectroscopy (XPS) and time-of-flight secondary ion mass spectrometry (ToF-SIMS) to analyze uniformity and composition. The XPS technique can be applied and established as a method for the optimal analysis of thin films deposited on LHAR structures. Both techniques provide a complementary analysis of material formation, elemental distribution, measurement along the LHAR depth range, and can probe differences between deposition processes.

Enhancing the overturning resistance capacity of high aspect ratio structure through hybrid base isolation and inter-storey isolation

The high-aspect ratio of structures is usually limited to a small range for base isolation (BI), due to the necessity of ensuring resistance to overturning. This limitation restricts the application of friction pendulum bearings (FPBs) in structures with large high-aspect ratios. This article aims to explore the application of hybrid base isolation and inter-storey isolation (BIISI) in structures with large high-aspect ratio. The theoretical basis of the BIISI was first analyzed in terms of overturning resistance. Subsequently, nonlinear dynamic numerical simulations were conducted on a building with a high aspect ratio to simulate its response subjected to typical pulse-type and non-pulse-type earthquakes. The overturning resistance of the structure and seismic dynamic responses were evaluated. A series of parametric studies were also conducted to investigate the effects of FPB properties, peak ground acceleration (PGA), the friction coefficient ratio and the radius of FPBs between inter-storey isolation storey and base isolation storey on the overturning resistance performance of isolated structures. It is demonstrated that superstructure is meticulously partitioned into two independent sliding structural elements through the BIISI, and it can significantly improve the overturning resistance of buildings with a large high-aspect ratio. PGA and FPB properties show significant differences, but the friction coefficient ratio and the radius of FPBs between the inter-storey isolation storey and base isolation storey show limited influences on the overturning resistance of the structure.

Oxygen atom activated ZIF-67/carbon cloth in plasma system for CO2 reduction

ZIF-67 was grown in situ on carbon cloth (CC) using a simple one-step method. The prepared ZIF-67/CC electrodes exhibited excellent CO2 reduction reaction (CO2RR) performance in a dielectric barrier discharge plasma reactor. The highest concentrations of produced formic acid and formaldehyde were 9.16 and 0.068 mmol L−1 at a reaction time of 1 h, respectively. The high performance is related to the unique high aspect ratio structure and pad-like cavity of ZIF-67, which results not only in an increase in the specific surface area for CO2 adsorption but also in the hydrophobicity of the electrode. Unexpectedly, the superoxide radical (·O2−) greatly affects the reduction performance of the electrode. In addition, the ZIF-67/CC electrode maintained good CO2RR performance in the presence of different pollutants, and the production of formic acid and formaldehyde increased to 10.81 and 0.11 mmol L−1 at 1 h with the addition of 10 mg L−1 phenol. This research provides new directions in the field of plasma catalysis.

A robust COF membrane on polyethylene support via ethanol-assisted self-assembly of COF nanosheets for efficient desalination

Fabrication of high-rejection covalent organic framework (COF) membranes for desalination remains a significant challenge, due to processing limitations and substrate mismatches. Herein, we report an ethanol-assisted self-assembly strategy for preparing high-rejection COF membranes from anionic TpPa-SO3Na COF (SCOF) nanosheets. This method promotes SCOF dispersion in ethanol with high aspect-ratio structures and elimination of interlayer charge, thus facilitating the formation of defect-free SCOF membranes (COFMs). Furthermore, polyvinyl alcohol (PVA) was used to modify commercial polyethylene (PE) supports ensuring compatibility with the high-rejection SCOF layers. The hydrophilic PVA@PE support with appropriate surface pore induces the SCOF nanosheets to form a complete stacking structure. The resultant COFM (MEtOH) exhibit an impressive Na2SO4 rejection rate of 98.83 % and a pure water flux of 4.35 L m−2 h−1, demonstrate exceptional rejection stability under elevated pressure, acidic or alkaline conditions, and high salt concentrations. The superior desalination performance of the COFMs surpasses the most reported 2D desalination membranes.

Modelling laser modified secondary electron yield response of surfaces

Electron clouds hinder the operation of particle accelerators. In the Large Hadron Collider (LHC), the copper beam screens are located within close proximity to the beam path, resulting in beam-induced electron multipacting, which is the main source of electron cloud formation. Conditions for multipacting are encountered when such surfaces have a secondary electron yield (SEY) greater than unity. Roughening the surface through laser processing offers an effective solution for reducing secondary electrons. Laser ablation leaves behind a complex rough, multi-scale geometrical surface with an altered chemical composition. Current models often over-simplify the geometry, do not have sufficient experimental data to derive input parameters, and exclude SEY-reducing mechanisms such as the surface chemistry. Leading to electron-matter interactions which do not resemble that of a real surface. Here, this complex surface is studied on copper used in the LHC, and the influence of microgeometry, inhomogeneous nanostructure and complex surface chemistry on the SEY is investigated. A novel, improved model is proposed that characterises these sophisticated structures, enabling the efficient design of surfaces to reduce SEY. To validate the model, samples were made using a variety of laser parameters. Modelling insights revealed that secondary electron suppression is not only caused by the microgeometry but also the nanostructure and chemical modification play a role. Contrary to the conventional theory, high aspect ratio structures are not necessarily required for effective SEY reduction. Currently, the model is applicable to a variety of surface morphologies and could be employed for other materials.

Novel Fast Cure Silicone Inks for Single‐Step, Support‐Free 3D Printing of Tall, Overhanging, and High Aspect Ratio Structures

AbstractSilicone elastomers have a broad variety of applications, such as soft robotics, biomedical devices, and structural metamaterials. The extrusion‐based method known as direct ink write (DIW) has enabled the production of additively manufactured silicone structures. However, this method is limited to manufacturing mostly planar or pseudo‐3D structures. Due to the low self‐supporting capabilities of extruded strands for traditional silicone‐based “inks,” obtaining tall or overhanging structures, or structures comprised by thin walls is not feasible. Here, a novel Fast Cure silicone‐based ink is demonstrated that enables manufacturing of complex 3D structures. The Fast Cure ink is a two‐part mixture and silicone structures are produced by inline mixing and coextrusion of a part containing a catalyst (part A) and a part containing a crosslinker (part B). By the virtue of crosslinking, the extruded strands rapidly rigidize, increasing their self‐supportive capacity. Hence, structures can be obtained with superior shape retention and previously unobtainable parts are realized that are tall, with aspect ratios higher than 3, and have overhanging features, achieving inclination angles smaller than 35° with respect to the printing plane. These minimal sag parts are achieved without requiring extra curing or mechanisms, support structures, or suspension baths.

Copper-Cystine Biohybrid-Embedded Nanofiber Aerogels Show Antibacterial and Angiogenic Properties.

Copper-cystine-based high aspect ratio structures (CuHARS) possess exceptional physical and chemical properties and exhibit remarkable biodegradability in human physiological conditions. Extensive testing has confirmed the biocompatibility and biodegradability of CuHARS under diverse biological conditions, making them a viable source of essential Cu2+. These ions are vital for catalyzing the production of nitric oxide (NO) from the decomposition of S-nitrosothiols (RSNOs) found in human blood. The ability of CuHARS to act as a Cu2+ donor under specific concentrations has been demonstrated in this study, resulting in the generation of elevated levels of NO. Consequently, this dual function makes CuHARS effective as both a bactericidal agent and a promoter of angiogenesis. In vitro experiments have shown that CuHARS actively promotes the migration and formation of complete lumens by redirecting microvascular endothelial cells. To maximize the benefits of CuHARS, they have been incorporated into biomimetic electrospun poly(ε-caprolactone)/gelatin nanofiber aerogels. Through the regulated release of Cu2+ and NO production, these channeled aerogels not only provide antibacterial support but also promote angiogenesis. Taken together, the inclusion of CuHARS in biomimetic scaffolds could hold great promise in revolutionizing tissue regeneration and wound healing.

Advancing wavefront shaping with resonant nonlocal metasurfaces: beyond the limitations of lookup tables

Resonant metasurfaces are of paramount importance in addressing the growing demand for reduced thickness and complexity, while ensuring high optical efficiency. This becomes particularly crucial in overcoming fabrication challenges associated with high aspect ratio structures, thereby enabling seamless integration of metasurfaces with electronic components at an advanced level. However, traditional design approaches relying on lookup tables and local field approximations often fail to achieve optimal performance, especially for nonlocal resonant metasurfaces. In this study, we investigate the use of statistical learning optimization techniques for nonlocal resonant metasurfaces, with a specific emphasis on the role of near-field coupling in wavefront shaping beyond single unit cell simulations. Our study achieves significant advancements in the design theoretical conception of resonant metasurfaces. For transmission-based metasurfaces, a beam steering design outperforms the classical design by achieving an impressive efficiency of 80% compared to the previous 23%. Additionally, our optimized extended depth-of-focus (EDOF) metalens yields a remarkable five-fold increase in focal depth, a four-fold enhancement in focusing power compared to conventional designs and an optical resolution superior to 600 cycle/mm across the focus region. Moreover, our study demonstrates remarkable performance with a wavelength-selected beam steering metagrating in reflection, achieving exceptional efficiency surpassing 85%. This far outperforms classical gradient phase distribution approaches, emphasizing the immense potential for groundbreaking applications in the field of resonant metasurfaces.

Multi- and Gray-Scale Thermal Lithography of Silk Fibroin as Water-Developable Resist for Micro and Nanofabrication.

Silk fibroin (SF) is a natural material with polymorphic structures that determine its water solubility and biodegradability, which can be altered by exposing it to heat. Here, a hybrid thermal lithography method combining scalable microscale laser-based patterning with nanoscale patterning based on thermal scanning probe lithography is developed. The latter enables in addition grayscale patterns to be made. The resolution limit of the writing in silk fibroin is studied by using a nanoscale heat source from a scanned nanoprobe. The heat thereby induces local water solubility change in the film, which can subsequently be developed in deionized water. Nanopatterns and grayscale patterns down to 50nm lateral resolution are successfully written in the silk fibroin that behaves like a positive tone resist. The resulting patterned silk fibroin is then applied as a mask for dry etching of SiO2 to form a hard mask for further nano-processing. A very high selectivity of 42:1 between SiO2 and silk fibroin is obtained allowing for high-aspect ratio structure to be fabricated. The fabricated nanostructures have very low line edge roughness of 5±2nm. The results demonstrate the potential of silk fibroin as a water-soluble resist for hybrid thermal lithography and precise micro/nanofabrication.

Nitric Oxide-Releasing Tubular Polymersomes toward Advanced Gas Therapeutic Carriers.

Nitric oxide (NO) not only plays a vital role in a series of physiological processes but also has great potential for therapeutic applications. One of the existing challenges in using NO as a gas therapeutic is the inconvenience of gaseous NO storage, and thus, it is of importance to develop NO-releasing vehicle platforms. Although a variety of polymer-based NO-releasing nanoparticles have been constructed, a majority of the systems are limited to spherical morphologies. Here we present the preparation of biodegradable NO-releasing amphiphilic block copolymers containing poly(ethylene glycol) (PEG) and poly(trimethylene carbonate-4-nitro-3-(trifluoromethyl)) (PTMC-NF), which can self-assemble into tubular polymersomes. The tubular polymersomes with high aspect ratio structures showed much faster NO-releasing behavior, in contrast to their spherical counterparts under light irradiation. We found that the amount of NO released from tubular polymersomes is 1.5 times that from spherical polymersomes. More importantly, the tubular polymersomes have an enhanced anticancer performance compared to spherical polymersomes, demonstrating that the morphology of the NO-releasing polymersomes has a significant effect on their anticancer ability. In view of the benefits of NO-releasing tubular polymersomes, we expect that they can be used as an efficient NO delivery system for enhanced gas therapy.

Nano Precision Noncontact Probing System Using Tungsten Ball Tip for High Aspect Ratio Structures With Horizontal Internal Dimensions Below 100 μm

Nano Precision Noncontact Probing System Using Tungsten Ball Tip for High Aspect Ratio Structures With Horizontal Internal Dimensions Below 100 μm

High-aspect-ratio nanostructured hydroxyapatite: towards new functionalities for a classical material.

Hydroxyapatite-based materials have been widely used in countless applications, such as bone regeneration, catalysis, air and water purification or protein separation. Recently, much interest has been given to controlling the aspect ratio of hydroxyapatite crystals from bulk samples. The ability to exert control over the aspect ratio may revolutionize the applications of these materials towards new functional materials. Controlling the shape, size and orientation of HA crystals allows obtaining high aspect ratio structures, improving several key properties of HA materials such as molecule adsorption, ion exchange, catalytic reactions, and even overcoming the well-known brittleness of ceramic materials. Regulating the morphogenesis of HA crystals to form elongated oriented fibres has led to flexible inorganic synthetic sponges, aerogels, membranes, papers, among others, with applications in sustainability, energy and catalysis, and especially in the biomedical field.

Electrochemistry in Photonic Devices Processing: a Disruptive Approach in GaN Technology

Electrochemistry, except the electrodeposition of metal for making contacts, is rarely represented in microelectronics, despite the many possibilities it may offer like “soft” surface treatments (no surface bombardment, low damage), very sensitive methods (femtoampers sensitivity) and its large compatibility with high aspect ratio structures (TSV Cu filling). Nowadays, the More than Moore law compels researchers to look for other solutions than standard microelectronic processes to reach disruptive solutions: electrochemical processes may provide this new pathway. In that context, our study focuses on III-N material, specifically on GaN porosification through electrochemical anodization for photonic applications. After a study to understand GaN electrochemistry, we will see how new photonic device architectures may arise from the controlled porosification of GaN.Before going towards photonic applications, the understanding of the GaN electrochemical system is required. First we show that the variation of the main electrochemical and material parameters like GaN doping level, anodization potential, and electrolyte composition enables the fine-tuning of the porosity level, pore density, pore size and pore morphology. Then nano-indentation, ellipsometry and reflectometry measurements give us access to a good knowledge of the variation of the Young modulus and refractive index versus porosity level and pore morphology. The measured physico-chemical properties, mechanical as well as optical, of porous GaN eventually paves the way for new device developments.In our talk, we will show how electrochemistry requirements have an impact on the design of the final structure. We will focus on two porous GaN structures built from the previous electrochemical systemic study on GaN thin layers: i) a LED on porous GaN Bragg mirror (DBR) and ii) a relaxed InGaN pseudo-substrate for RGB micro-display applications. LED on DBR: Specifically designed epitaxial stack and technology allow the fabrication of a blue GaN/InGaN based LED structure on a DBR made of alternating porous and dense GaN layers. The optimized one-step electrochemical process results in a very efficient DBR with 99,99% reflectance and a large stop band centered on 460-520 nm. The presence of the porous GaN DBR below the LED stack exalts the photoluminescence and the cathodoluminescence signals compared with standard LEDs grown on bulk substrates. These results open a new field of research regarding the capability of tuning GaN refractive index. Fully relaxed InGaN structure for red light emission: Results on partially or totally relaxed InGaN pseudo-substrate will be presented. The InGaN pseudo-substrate relaxation helps indium incorporation in the overgrown quantum wells and enables light emission in long wavelength towards red. The control of the electrochemical and semi-conductor parameters shows that the relaxation of the III-N structure measured by HR-DRX clearly depends on the porosity level and pore morphology. This means that relaxation can be fine-tuned: that will allow an epitaxial regrowth of micro-LED structures compatible with high indium concentration in the quantum wells and possibly RGB micro-LED fabrication for micro-display applications. In that part, we will demonstrate how electrochemistry associated with microelectronic technology brings a new way of controlling relaxation of InGaN on GaN and how the obtained experimental results are promising for the fabrication of high indium content relaxed structure. Through these two examples, we put in evidence how electrochemistry allows inventing solutions unimaginable with the standard microelectronics processes.

Conformal Electrodeposition of Mesoporous Silica over High Aspect Ratio (AR>100) Nanomesh Electrodes

The high surface area provided by the nanopores of ordered mesoporous silica thin films enables a wide range of electrochemical applications such as sensors, catalysis, energy storage and ion-selective membranes. Further improvements are possible by coating such thin films on large surface area electrodes with high aspect ratios (> 100) to increase the active surface area. Atomic layer deposition (ALD) is often preferred to deposit conformal thin film oxides on high aspect ratio structures. Such vapor-phase depositions are limited by the available surface reactive sites to deposit thin films of thickness ranging from sub-nanometer to few tens of nanometer. However, there is a tradeoff in terms of deposition time/cycles to achieve quality films especially when high aspect ratios (>100) substrates are introduced. Electrochemistry offers an alternative, versatile method to conformally coat layers on 3D electrode surfaces. The electrochemically assisted self-assembly (EASA) of mesoporous silica, utilizes electrochemical reactions to locally increase the pH near the electrode surface, which in turn catalyzes the silica gelation and surfactant self-assembly, thus causing the controlled growth of mesoporous silica thin films [1]. Recently, our group has shown that good quality mesoporous silica films with thickness between 20-2000 nm could be achieved by controlling the hydrodynamic layer in a rotating disc electrode setup [2]. Moreover, EASA of mesoporous silica offers meso-channels that are aligned perpendicular to the underlaying conductive substrate which is optimal for mass-transport.In this follow-up work, we demonstrate a reliable, electrochemically controlled, conformal deposition of mesoporous silica onto large surface area nanomesh electrodes with an aspect ratio close to 100. Nanomesh electrodes developed in our group at imec, is built up of a regularly spaced (50 nm), inter-connected network of vertical and horizontal nanowires of diameter ~40 nm. These electrodes offer an 80x area enhancement (80 cm2 per geometric cm2) while maintaining a porosity close to 75%. We show that, the extent of silica deposition over these nanomesh electrodes can be electrochemically controlled from conformal coatings (~10 nm thick) uniformly coating the whole nanomesh architecture to complete fill and overfill of the nanomesh electrodes (~4 µm thick). Furthermore, excellent mass-transport properties of various silica coated nanomesh electrodes has been demonstrated using a ruthenium hexaammine redox probe. Finally, the area enhancement offered by the silica coated Ni nanomesh is demonstrated using the characteristic accumulation of a positively charged [Ru(NH3)6]3+ probe within the negatively charged silica nanochannels, which shows 55x increase for the amount of charge from the probe stored in the coated nanomesh, compared to a planar silica layer, consistent with the expected surface area enhancement of the 4 µm thick nanomesh electrodes.

(Invited) Atomistic Insights into Continuous and Area-Selective ALD Processes: First-Principles Simulations of the Underpinning Surface Chemistry

Atomic layer deposition (ALD) is a highly advanced thin film deposition technology that has found widespread use in nanoelectronics, photovoltaics, fuel cell and recently all-solid-state battery applications. It is widely regarded as the state-of-the-art technique for producing thin films due to its exceptional conformality on high-aspect ratio structures, atomic level thickness control, and tuneable film composition. In recent years, area-selective atomic layer deposition (AS-ALD) has emerged as a promising technology for high-fidelity nano-patterning, and significant progress has been made in understanding and developing highly selective processes for various material systems. Along these lines, we have recently shown that high-throughput, low defectivity, highly selective SiO2 deposition can be achieved on various substrates by combining atmospheric-pressure spatial ALD with integrated area-deactivation using small molecule inhibitors and plasma-enhanced spatial etching [1].ALD is a surface-controlled technique that relies on the self-limiting reactions of the precursors and co-reactants with the deposition surface in alternating cycles. The initial step in ALD nucleation on the target substrate is a key factor in the deposited film quality, and efficient precursor binding on the surface is critical. Molecular dynamics (MD) simulations and minimum-energy reaction pathway analysis based on ab initio Density Functional Theory (DFT) calculations provide invaluable insights into the surface chemistry, enabling customisation of ALD processes to boost uniformity, conformality, and area-selectivity of the resulting films.In this talk, I will discuss how first-principles simulations can be used synergistically with experimental findings to achieve high-efficiency plasma-enhanced atomic-layer cleaning (ALC) of impurities from various ALD films and substrates, design proper chemical surface modifications that enable continuous and conformal ALD nucleation even on chemically-inert surfaces (like graphene), and unveil the particular surface chemistry governing high-fidelity area-selectivity with an atomic-level precision in ultrathin coatings [1-9]. By combining the insights gained from first-principles simulations with experimental techniques, we can push the frontiers of device manufacturing to new heights, opening up exciting possibilities for further technological advances in nanoelectronics, photovoltaics, fuel cell and energy storage applications.[1] Advanced Materials, Just Accepted, (DOI: 10.1002/adma.202301204); [2]Nanoscale, 2021, 13, 10092-10099; [3] Chem. Mater. 2019, 31 (4), 1250-1257.; [4] Adv. Mater. Interfaces 2018, 5 (13), 1800268.; [5] Chem. Mater. 2017, 29 (3), 921–925.; [6] ACS Nano 2017, 11 (9), 9303–9311.; [7] Sol. Energy Mater. Sol. Cells 2017, 163, 43–50.; [8] Chem. Mater. 2017, 29 (5), 2090–2100.; [9] Nanoscale 2016, 8 (47), 19829–19845. Figure 1

Understanding Growth Mechanism of Atomic Layer Deposition of Tisiox for Spacer in Double Patterning Process

The aggressive scaling down of patterning technology in semiconductor industry is challenging owing to the limitation of current extreme ultraviolet EUV lithography technique, thus applying self-aligned double patterning (SADP) is essential. In this regard, TiSiOx may be a promising spacer material for SADP, which is beneficial to tolerate high aspect ratio structure triggered by shrinkage in patterning size. However, atomic layer deposition (ALD) of quaternary materials is usually faced to unexpected growth characteristics leading to undesired film qualities, while precise control of thickness and film properties is vital to achieve SADP. This work provide understanding of how growth characteristics of ALD TiSiOx are deviated according to process temperature. At 100 °C, hygroscopic TiSiOx surface which is originated by the presence of Ti-O-Si bond is exposed to H2O by-product leading to enhanced growth rate of TiSiOx compared to ideal case. If the process temperature is increased to 200 °C, opposite behavior is observed since hygroscopic TiSiOx surface characteristic is no more dominant to growth rate of ALD TiSiOx due to dehydroxylation. Theses nonconventional growth characteristics dramatically influence on hydroxyl concentration in TiSiOx films resulting in different spacer qualities such as dry etch rate and elastic modulus. These correlative results suggest that the process conditions should be modulated to suppress hydroxyls incorporation into growing TiSiOx surface during ALD to obtain a high-quality TiSiOx thin films for SADP.

In situ monitoring of sapphire nanostructure etching using optical emission spectroscopy

Fabrication of nanostructures on sapphire surfaces can enable unique applications in nanophotonics, optoelectronics, and functional transparent ceramics. However, the high chemical stability and mechanical hardness of sapphire make the fabrication of high density, high aspect ratio structures in sapphire challenging. In this study, we propose the use of optical emission spectroscopy (OES) to investigate the sapphire etching mechanism and for endpoint detection. The proposed process employs nanopillars composed of polymer and polysilicon as an etch mask, which allows the fabrication of large-area sapphire nanostructures. The results show that one can identify the emission wavelengths of key elements Al, O, Br, Cl, and H using squared loadings of the primary principal component obtained from principal component analysis of OES readings without the need of domain knowledge or user experience. By further examining the OES signal of Al and O at 395.6 nm, an empirical first-order model can be used to find a predicted endpoint at around 170 s, indicating the moment when the mask is completely removed, and the sapphire substrate is fully exposed. The fabrication results show that the highest aspect ratio of sapphire nanostructures that can be achieved is 2.07, with a width of 242 nm and a height of 500 nm. The demonstrated fabrication approach can create high sapphire nanostructures without using a metal mask to enhance the sapphire etch selectivity.

Dark field imaging of high aspect ratio structures - a simple model.

A simplified model for dark-field optical imaging of three-dimensional high aspect ratio micro- and nano- structures is proposed, to reduce the time taken to simulate object fields with in-plane scattering between different parts of the object. Primary scattering is found by assuming that illumination of Manhattan geometries generates a set of spherical edge waves, following the incremental theory of diffraction. Secondary scattering is found by assuming that primary scattering is re-scattered from nearby features. Diffraction coefficients are simplified, and the number of illuminating beams is limited to those generating waves that enter the objective lens. Images obtained using TE and TM polarizations are compared, and results are benchmarked against a vectorial finite element model. Applications lie in simulating optical inspection of structures containing vertically etched features including MEMS and NEMS.

Modeling the impact of incomplete conformality during atomic layer processing

Atomic layer processing (ALP) is a modern fabrication technique for the deposition or etching of materials, which provides precise control of film thickness, composition, and conformality on a nanometer scale. This makes it crucial for the fabrication of high aspect ratio (HAR) structures, such as 3D NAND memory stacks, as its self-limiting nature provides enhanced conformality compared to traditional processes. However, as the number of NAND stacks grows and the aspect ratio continues to increase, deviations from full conformality can often occur due to precursor desorption from the surface. In this regard, a model for surface coverage during ALD in the presence of desorption, leading to incomplete conformality, has been developed and implemented in process simulation frameworks. This work is an extension of our previous research which concentrated on developing an accurate modeling approach for ALD in HAR structures (L.Aguinsky et al., Solid State Electron. 201, 2023). The model combines existing Knudsen diffusion and Langmuir kinetics methods and includes the Bosanquet formula for gas-phase diffusivity and reaction reversibility. It has been incorporated into academic and commercial level-set-based topography simulators. The parameters for the model have been calibrated using published results for the ALD of Al2O3 from trimethylaluminum (TMA) and H2O in HAR geometries. The temperature dependence of the H2O step is likewise analyzed, revealing an activation energy of 0.178eV, which is consistent with recent experiments. In the TMA step, the Bosanquet formula leads to improved accuracy, and the same parameter set is able to reproduce multiple experiments, demonstrating that the model parameters accurately capture reactor conditions. Finally, the developed model is combined with atomic layer etching (ALE) to simulate the controlled, conformal deposition of HfO2 inside HAR 3D NAND structures.

Experimental characterization and modal analysis for woven composite high aspect ratio beam

In modern engineering applications such as aerial vehicles, composite structures are widely implemented due to their high structural stiffness and very low weight-to-lift ratio. They also enable designers to control their mechanical properties as well as the manufacturing method and fabrication quality to achieve the required structural performance. However, various manufacturing methods and the fabrication process can be considered production imperfections. In this study, an assessment of the fabrication quality for a typical composite structure is implemented. As considered for airplane wings and helicopter blades, a high aspect ratio structure is implemented as a case study. This structure is composed of laminated woven carbon fiber/epoxy resin fabricated using the vacuum bagging production method. To characterize the mechanical properties of the proposed structure, a mechanical tensile test is carried out. An experimental modal analysis via roving hammer test is implemented to examine the dynamic behavior of the proposed structure. To assess the quality of manufacturing and fabrication quality, the obtained natural frequencies are compared with the ones computed using a numerical technique using the Finite Element Method (FEM). The analytical problem using MATLAB had been established to emphasize the experimental results. Results showed that good manufacturing quality is achieved by using the vacuum bagging production method. Also, the experimental results agree well with both the numerical and theoretical results, Which indicates good manufacturing quality.