Van der Waals materials have recently received great interest in the research community because of the ability to exfoliate and grow mono- or few-layer materials. Some important future possible applications are found in the field of nanoelectronics where extremely scaled transistors or magnetic memory devices are envisioned. However, there are more than 1,000 van der Waals materials known to date and an exhaustive experimental investigation is very expensive. This makes the accurate theoretical prediction of materials properties from first principles, enabling the identification of the most promising van der Waals materials possible, very valuable.We show how the dielectric, electronic, magnetic, and structural properties of various van der Waals materials can be determined from first principles. We exhibit our robust methodology to extract the dielectric response of a monolayer/few-layer structure and calculate the low- and high-frequency dielectric constant of hexagonal boron-nitride and transition metal dichalcogenides (TMDs). We reveal a relatively small dependence of the dielectric constant on the number of layers. Surprisingly, we find a very large ionic contribution the dielectric response in TMDs in the tetragonal phase.[1] We also show how elemental tellurium is a promising material for extremely scaled nanowires and a possible successor for silicon. We predict that when fabricated with extremely small diameter, tellurium nanowires have a bandgap that exceeds 1 eV, while silicon’s bandgap increases excessively to above 4 eV.[2] We also show how the van der Waals bonds in tellurium naturally favor the formation of nanowires. Finally, we show how the Curie temperature can be computed in dilute doped TMDs from first principles, taking into account crystal anisotropy.[1] A. Laturia, M. L. Van de Put, and W. G. Vandenberghe, "Dielectric properties of hexagonal boron nitride and transition metal dichalcogenides: from monolayer to bulk," npj 2D Materials and Applications, vol. 2, no. 1, p. 6, 2018/03/08 2018.[2] A. Kramer, M. L. Van de Put, C. L. Hinkle, and W. G. Vandenberghe, "Trigonal Tellurium Nanostructure Formation Energy and Band gap," in 2019 International Conference on Simulation of Semiconductor Processes and Devices (SISPAD), 2019, pp. 1-4: IEEE.
Read full abstract