Hexafluoroisopropyl alcohol-functionalized acrylic and styrenic monomers, such as 2-[4-(2-hydroxyhexafluoro isopropyl)cyclohexane]hexafluoroisopropyl acrylate (2), 2-[4-(2,2,2-trifluoro-1-methoxy-methoxy-1-trifluoromethylethyl)cyclohexane]hexafluoroisopropyl acrylate (3), and 2-[4-(2,2,2-trifluoro-1-ethoxymethoxy-1-trifluoromethylethyl)]styrene (4), were synthesized, and their (co)polymers were studied as photoresist platforms for 157 nm lithography. It was found that these (co)polymers are unusually transparent at 157 nm, and absorbances of poly(2) and poly(2-co-4) were determined to be 1.93 and 2.38 μm-1, respectively. Results indicated that both electron-withdrawing effects and bulkiness of CF3 groups play important roles in tailoring the absorbance of chromophores. Lithographic studies were carried out with poly(2)-based resists using 157 and 248 nm steppers, and it was demonstrated that, after selective modification, it is possible to use conventional resist backbones, such as acrylic or styrenic pol...