AbstractThe effects of current density (Jk) and bath temperature on the structure of deposition layer of nickel and electrochemical noise energy (ED) are studied, and the relationship between the structure of the deposit and ED is also discussed in detail using electrochemical noise technique in coupled with the scanning electron microscopy and the glancing angle X-ray diffraction techniques. The results show that ED theoretically mainly reflects the severity or rate of the local cathodic reaction rather than the integral cathodic reaction, and is markedly influenced by the electroplating current density (Jk)-depended nucleation/growth kinetics of the nickel deposit film. The proceeding of the nucleation (or the formation of new phase)/growth process of crystal nucleus on a foreign substrate possesses much more effect on ED value than the subsequent homogenous growth of the already formed film particles, and the factors which can accelerate the drastic change of the electrode surface state should result in large ED value.