The van der Pauw technique is the gold standard for measuring the sheet resistance of thin conductors by relying on the combination of two 4-point resistance measurements obtained in different current–voltage probe configurations. The presence of hysteresis and/or time-dependent effects will result in the van der Pauw technique producing inaccurate and misleading results. This limitation can be overcome by simultaneously measuring the two 4-point resistances at different frequencies with two lock-in amplifiers. In this work, we discuss in detail the fundamental requirements and practical considerations for the proper implementation of this measurement technique. Furthermore, we show that the relative deviation between sequential and simultaneous measurements is below 1% in the region of interest for a graphene-based field-effect transistor and 0.04% on average for resistive test structures. The simultaneous van der Pauw technique could therefore become a new standard for reliably assessing the electrical properties of 2D materials and devices.
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