Function Of UV Dose Research Articles

Kinetics of photodegradation and nanoparticle surface accumulation of a nanosilica/epoxy coating exposed to UV light

Temperature effect on the kinetics of photodegradation and surface accumulation of nanoparticles in an epoxy nanocoating exposed to ultraviolet light (UV) was investigated. A model epoxy coating containing 5% untreated nanosilica was selected. Exposed film specimens were removed at specified UV dose intervals for measurements of chemical degradation of the epoxy component, and nanosilica accumulation on specimen surface release as a function of UV dose for four temperatures. The chemical degradation was measured using Fourier transform infrared spectroscopy, X-ray photoelectron spectroscopy, and UV–visible spectroscopy. Atomic force microscopy was employed to determine the kinetics of nanosilica accumulation on the nanocoating surface during UV exposure. The temperature dependence behaviors of kinetic parameters obtained by various measurement techniques will be used to better understand the degradation mechanism and surface accumulation of nanoparticles in exterior nanocoatings.

Applications of a Rapid Endospore Viability Assay for Monitoring UV Inactivation and Characterizing Arctic Ice Cores

We have developed a rapid endospore viability assay (EVA) in which endospore germination serves as an indicator for viability and applied it to (i) monitor UV inactivation of endospores as a function of dose and (ii) determine the proportion of viable endospores in arctic ice cores (Greenland Ice Sheet Project 2 [GISP2] cores; 94 m). EVA is based on the detection of dipicolinic acid (DPA), which is released from endospores during germination. DPA concentrations were determined using the terbium ion (Tb3+)-DPA luminescence assay, and germination was induced by L-alanine addition. The concentrations of germinable endospores were determined by comparison to a standard curve. Parallel EVA and phase-contrast microscopy experiments to determine the percentage of germinable spores yielded comparable results (54.3% +/- 3.8% and 48.9% +/- 4.5%, respectively), while only 27.8% +/- 7.6% of spores produced CFU. EVA was applied to monitor the inactivation of spore suspensions as a function of UV dose, yielding reproducible correlations between EVA and CFU inactivation data. The 90% inactivation doses were 2,773 J/m2, 3,947 J/m2, and 1,322 J/m2 for EVA, phase-contrast microscopy, and CFU reduction, respectively. Finally, EVA was applied to quantify germinable and total endospore concentrations in two GISP2 ice cores. The first ice core contained 295 +/- 19 germinable spores/ml and 369 +/- 36 total spores/ml (i.e., the percentage of germinable endospores was 79.9% +/- 9.3%), and the second core contained 131 +/- 4 germinable spores/ml and 162 +/- 17 total spores/ml (i.e., the percentage of germinable endospores was 80.9% +/- 8.8%), whereas only 2 CFU/ml were detected by culturing.

Photocleavage of Pyridyl-Based Aromatic Polyureas

The photophysical properties of a metal chelating pyridyl-based aromatic ureas and poly(1,4-phenylene-2,6-pyridylurea) were investigated. In their solution state and upon exposure to 365 nm UV radiation, these low and high molecular weight compounds were found to cleave the urea linkage nearly quantitatively, generating the corresponding amine-terminated subunits and CO2. Through a series of model compounds along with nuclear magnetic resonance (NMR), UV/vis absorption, and fluorescence spectroscopy characterization, the photocleavage process was delineated as a function of UV dose, O2, and water. The presence of water was found crucial to this photocleavage process with O2 playing a role only in subsequent oxidation of resulting amine functionalities. The experimental results support a light-assisted hydrolysis of the urea bond as the most plausible photocleavage mechanism. The photocleavage of such pyridyl-based ureas can potentially find usages in light-assisted base generation and/or for releasing metal cations.

Photo-induced decomposition of 2-chloroaniline in aqueous solution.

A study was performed on the oxidizing degradation of 2-chloroaniline (used as a model pollutant in water) by photolysis (lambda = 254 nm). The change of spectrum and substrate concentration of treated solutions was measured spectrophotometrically as well as by HPLC. The yields of the degradation products (chloride ions, ammonium ions, formaldehyde, etc.) were studied as a function of UV-dose. Their initial quantum yields (Qi) were determined by specific analysis. It was shown that the substrate photolysis in the presence of N2O is most efficient, followed by degradation in media saturated with pure oxygen and air. A probable reaction mechanism for the photo-induced degradation of 2-ClA is presented.

Molecular UV dosimeters of lanthanide complex thin films: AFM as a function of ultraviolet exposure

In a previous work we developed a molecular dosimeter of high sensitivity and selectivity to UV cumulative measurements, using as the active part a thin film produced by thermal evaporation of europium complexes. The Eu 3+ emission ( 5D 0→ 7F 2) is monitored as a function of UV dose, and a memory effect allows dosimetry measurements. All measurements were quantified by an integration sphere coupled to a radiometer that provides absolute dose measurements in J/cm 2 and may be related to the MED (minimum erythemal dose) of 28 mJ/cm 2 as a reference. In this work, the preliminary results about the photodegradation mechanism of the complexes at molecular level is presented through AFM images. We have observed that the organic ligands, which absorb the UV radiation and transfer to the ion emitters, may be photofragmenting and therefore interfering in the luminescence emission of these ions. This ligand photofragmentation process justifies the selectivity presented by the dosimeter. On the other hand, the non-dependence of the film morphology as a function of UV radiation exposure indicates a different behavior from that which we had suspected before, indicating a non-ablative process, which is the contrary to what was previously suggested.

Ultraviolet inactivation of feline calicivirus, human enteric viruses and coliphages.

Norwalk and Norwalk-like viruses (NLV) are major causes of food- and water-related disease in the United States. There is no host cell line in which the NLV can be tested for infectivity. Feline calicivirus (FCV) and NLV both belong to the family Caliciviridae. FCV can be assayed for infectivity in the Crandell Reese feline kidney cell line, so FCV serves as a surrogate for NLV. This study is the first report of UV inactivation of FCV and also of using the plaque technique, in contrast to the 50% tissue culture infectious dose end point technique, to determine the FCV infectivity titer. The infectivity titers (log10 plaque-forming units/mL) of UV-inactivated FCV, hepatitis A virus (HAV), poliovirus type 1 (PV1) and two small, round coliphages were plotted as a function of UV dose and analyzed by regression analysis and analysis of variance. These fitted straight-line curves represent exponential inactivation, so UV inactivation can be said to show "one-hit kinetics." The decimal inactivation doses of UV for FCV, HAV, PV1, MS2 and phiX174 were 47.85, 36.50, 24.10, 23.04 and 15.48 mW s/cm2, respectively. FCV appears to be the most UV resistant among the tested viruses.

Advanced oxidation of 4-chlorobenzaldehyde in water by UV-light, ozonation and combination of both methods

A comparative study was performed on the oxidizing degradation of 4-ClBzAl (used a model pollutant in water) by photolysis (λ=253.7 nm), ozonation and by combination of both methods. The resulting yields of the degradation products (Cl − ions, aldehydes, carboxylic acids) were investigated as a function of UV-dose and action of ozone. The product yields were determined by HPLC-analysis and their initial quantum yields (Q i) were calculated. Based on the results, it was shown that the synergistic action of UV-irradiation and ozone leads to a more efficient degradation of 4-ClBzAl. For explanation of the experimental results probable reaction mechanisms are suggested.

Loss of intragenomic DNA repair heterogeneity with cellular differentiation.

The influence of terminal differentiation on UV-induced DNA damage and its repair in transcriptionally active and inactive genomic sequences was investigated using the murine 3T3-T proadipocyte cell culture system. Actively cycling 3T3-T cells terminally differentiate into adipocytes after exposure to media containing platelet-depleted human plasma. Suitable DNA fragments were analyzed from four genes: beta-actin, adenosine deaminase, dihydrofolate reductase, and lipoprotein lipase. As a result of 3T3-T cell differentiation, lipoprotein lipase and beta-actin expression was modified, whereas adenosine deaminase and dihydrofolate reductase expression was not affected. A DNA fragment representing the transcriptionally inactive locus 70-38 was also evaluated. UV-induced cyclobutane pyrimidine dimers, detected as UV-specific endonuclease-sensitive sites, in each fragment increased linearly as a function of UV dose (0-20 J/m2) independently of gene expression or differentiation. Sequence-specific repair of dimers was measured in stem and terminally differentiated 3T3-T cells after UV irradiation (10 J/m2). For undifferentiated stem cells, the rate and extent of dimer repair was higher in the actively transcribed adenosine deaminase and dihydrofolate reductase genes than in the inactive lipoprotein lipase or 70-38 fragments, the greater difference being observed in the first 8 h post-UV irradiation. In contrast, similar dimer repair rates were found for each DNA fragment in terminally differentiated 3T3-T cells. These data suggest that cellular differentiation is accompanied by a loss of heterogeneity in intragenomic DNA repair.

DNA repair characteristics and mutability of the UV-sensitive V79 Chinese hamster cell mutant V-B11 (complementation group 7).

The V79 Chinese hamster cell mutant V-B11 has previously been assigned to a new complementation group (group 7) of UV-sensitive rodent mutants. The D10 for cell survival is approximately 6 J/m2 for V-B11, compared with approximately 15 J/m2 for the parental V79 cell line. The removal of (6-4) photoproducts from the genome overall is not impaired in V-B11, and the level of unscheduled DNA synthesis measured 2 h after UV irradiation is similar to that observed in the parental V79 cells. DNA repair replication measured as a function of UV dose is approximately 50% reduced in V-B11 in comparison with V79, when measured during the first 6 h after UV irradiation. Furthermore, in V-B11 the rate of cyclobutane dimer removal from the HPRT gene is slower than in wild-type cells. Despite the observed defects no effect on the UV-induced frequency of mutants at two loci: Na+/K(+)-ATPase and HPRT was found in V-B11 cells. The properties of V-B11 are compared with those of other UV-sensitive mutants.

In situ (6-4)photoproduct determination by laser cytometry and autoradiography

The UV-induced (6-4)photoproducts and their repair in individual human cells were quantitatively determined by argon-laser imaging microspectrofluorometry or autoradiography with a well-characterized monoclonal antibody against (6-4)photoproducts. (6-4)Photoproduct induction curves were linear as a function of UV dose, using both methods. The formation of (6-4)photoproducts was detected in the cells irradiated with as low as 10 and 25 J/m2 of UV by autoradiography and laser cytometry, respectively. Normal cells repaired more than 80% of the initial damage within 4 h post irradiation. In contrast, almost no repair was observed in xeroderma pigmentosum cells (complementation group A) within 8 h.

Sensitivity of carcinogen-treated DNA to inactivation by ultraviolet radiation

The DNA of bacteriophage SPO2c12 was treated with methylmethane sulfonate (MMS), β-propiolactone (BPL), 2-anthramine (AA) or benzo[ a]pyrene (BP) and then exposed to 254-nm radiation. Competent Bacillus subtilis host cells were transfected with DNA subjected to the carcinogen-UV treatment or with DNA treated with carcinogen only. Survival curves were obtained for loss of plaque-forming ability as a function of UV dose. The UV sensitivity of DNA treated with MMS, BPL or AA was not significantly different from that of untreated DNA. The results indicate that in competent B. subtilis the pathways for repair of alkylating agent damage and for repair of UV damage are probably different.

Characterization of ultraviolet light-induced ouabain-resistant mutations in chinese hamster cells

Ouabain-resistant mutations in Chinese hamster cells have been quantitatively characterized. The mutation frequencies were found to be induced curvelinearly with treatments of increasing doses of ultraviolet light (UV). For the range of UV doses tested (5–20 J/m 2), the observed mutation frequency, Y, as a function of UV dose X, follows a curvilinear function, Y = (−28 + 13.37 X − 1.52 X 2 + 0.08 X 3) · 10 −6. The frequencies of UV-induced mutations were directly correlated with cell survival, indicating a similar causal relationship between cell killing and mutation induction. Under the same experimental conditions, X-rays induced 6-thioguanine-, but not ouabain-, resistant mutations. UV-induced ouabain-resistant (oua r) mutants exhibit a selection disadvantage. Their phenotypic expressions are modifiable by various agents. Wild type and 16 oua r mutants were compared with respect to their sensitivity to ouabain inhibition of 86Rb uptake by whole cells. All the oua r mutants assayed are less sensitive to the drug than are wild-type cells. In the absence of ouabain, the Na +−K +-ATPase activities can be significantly higher or lower than that of the wild-type cells.

Repair of UV-induced dna damage and survival in yeast I. Dimer excision

The amount of pyrimidine dimer UV photoproduct lost from the DNA of irradiated yeast cells during dark incubation has been measured in various conditions. It was found that no dimers were lost when cells were incubated in saline. When the cells were incubated, with aeration, in a full growth medium, dimers were lost, most excision being complete within 4 h. Not all dimers were lost and the number lost was a function of UV dose. Maximum loss, amounting to 50 000 dimers per genome was observed after 4000 or 6000 erg/mm2 of UV. At higher doses, the number excised declined. Making the assumptions that dimers are the principal lethal product of UV, that a single dimer remaining in its genome is enough to prevent a cell from multiplying and that excision is the principal dark-repair process in yeast, these data were incorporated into the repair term of an expression relating survival to repair8 and it was found that the survival of yeast at doses up to 2000 erg /mm2 of UV could be quite accurately predicted. This is the first time it has been possible to account for survival in terms of measured repair. It is suggested that the divergence of the predicted and observed curves at higher doses is due to other repair processes known to exist in yeast.

Repair or UV-induced DNA damage and survival in yeast I. Dimer excision

The amount of pyrimidine dimer UV photoproduct lost from the DNA of irradiated yeast cells during dark incubation has been measured in various conditions. It was found that no dimers were lost when cells were incubated in saline. When the cells were incubated, with aeration, in a full growth medium, dimers were lost, most excision being complete within 4 h. Not all dimers were lost and the number lost was a function of UV dose. Maximum loss, amounting to 50 000 dimers per genome was observed after 4000 or 6000 erg/mm2 of UV. At higher doses, the number excised declined. Making the assumptions that dimers are the principal lethal product of UV, that a single dimer remaining in its genome is enough to prevent a cell from multiplying and that excision is the principal dark-repair process in yeast, these data were incorporated into the repair term of an expression relating survival to repair8 and it was found that the survival of yeast at doses up to 2000 erg /mm2 of UV could be quite accurately predicted. This is the first time it has been possible to account for survival in terms of measured repair. It is suggested that the divergence of the predicted and observed curves at higher doses is due to other repair processes known to exist in yeast.

Repair of UV-induced DNA damage and survival in yeast I. Dimer excision

The amount of pyrimidine dimer UV photoproduct lost from the DNA of irradiated yeast cells during dark incubation has been measured in various conditions. It was found that no dimers were lost when cells were incubated in saline. When the cells were incubated, with aeration, in a full growth medium, dimers were lost, most excision being complete within 4 h. Not all dimers were lost and the number lost was a function of UV dose. Maximum loss, amounting to 50 000 dimers per genome was observed after 4000 or 6000 erg/mm2 of UV. At higher doses, the number excised declined. Making the assumptions that dimers are the principal lethal product of UV, that a single dimer remaining in its genome is enough to prevent a cell from multiplying and that excision is the principal dark-repair process in yeast, these data were incorporated into the repair term of an expression relating survival to repair8 and it was found that the survival of yeast at doses up to 2000 erg/mm2 of UV could be quite accurately predicted. This is the first time it has been possible to account for survival in terms of measured repair. It is suggested that the divergence of the predicted and observed curves at higher doses is due to other processes known to exist in yeast.