W ith the advent of nanofabrication techniques, such as electron-beam lithography and focused ion beam milling, it is now possible to pattern metallic structures at the nano scale. is enables the exploitation of the plasmonic behavior of metals to create ultra-compact photonic devices for sensing, guiding or focusing.1 In this context, we recently reported on the experimental demonstration of far-fi eld lensing using a plasmonic nano-slit array.2 Refractive lenses are widely used in applications ranging from imaging to concentrating light. e miniaturization of lenses has been essential for the development of modern solid-state image sensors and might have important implications for other opto-electronic applications, including solid-state displays and lighting. e focusing ability of conventional, dielectric-based micro-lenses, however, deteriorates as their physical dimensions are reduced toward a singlewavelength scale. Moreover, the small size limits scientists’ ability to implement devices that are fl exible enough to properly focus light incident at oblique angles directly below the lens. e nano-patterning of optically thick metallic fi lms off ers an alternative that alleviates some of the shortcomings of refractive lenses. In this approach, a “plasmonic” lens is formed by an array of nano-scale slits in a planar metallic fi lm. For a light incident upon such a structure, the phase shift experienced by light as it passes through each individual slit is sensitive to the width.3 With the adjustment of the properties of individual slits, it is possible to create a curved phase front for the transmitted fi eld and thus to achieve focusing behavior. We recently implemented such far-fi eld planar nano-slit lenses using a combination of thin-fi lm deposition methods and focused ion beam milling. We demonstrated with confocal scanning optical microscopy that these structures can act as far-fi eld cylindrical lenses for light at optical frequencies.2 Moreover, we showed excellent agreement between the full electromagnetic fi eld simulations of the design, which include both evanescent and propagating modes, and the far-fi eld, diff ractionlimited confocal measurements. is demonstration is a crucial step in the realization of this potentially important technology, which off ers a range of processing and integration advantages over conventional shaped-based dielectric lenses. For example, the planar geometry facilitates integration using industrystandard semiconductor technology, and the geometry-based design off ers fl exibility that is not easily achieved with refractive lenses at wavelength-size scales. is makes planar “plasmonic” lenses attractive for integrated optoelectronic applications that require angle-compensating micro-lenses. We have shown already that, by introducing position-dependent phase Planar fareld “plasmonic” lens based on nano-slit array in metallic lm. (a) Geometry of the lens consisting of a 400-nm-thick gold lm with air slits of widths between 80 and 150 nm (light blue), sitting on a fused silica substrate (dark blue). (b) Scanning electron micrograph of the structure viewed from the air-side. (c) Focusing pattern measured with a confocal scanning optical microscope (CSOM). (d) Finite-difference frequency-domain simulated focusing pattern of the eld intensity through the center of the slits. (a) (c) (d) 0