We previously proposed a dual FEL configuration on the UV Demo FEL at Jefferson Lab that would allow simultaneous lasing at FIR and UV wavelengths [1]. The FIR source would be an FEL oscillator with a short wiggler providing diffraction-limited pulses with pulse energy exceeding 50 microJoules, using the exhaust beam from a UVFEL as the input electron beam. Since the UV FEL requires very short pulses, the input to the FIR FEL is extremely short compared to a slippage length and the usual Slowly Varying Envelope Approximation (SVEA) does not apply. We use a non-SVEA code [2] to simulate this system both with a small energy spread (UV laser off) and with large energy spread (UV laser on).