Filtered Arc Deposition Process Research Articles

Frictional properties of diamond-like carbon coated tool in dry intermittent machining of aluminum alloy 5052

Abstract In this study, an orthogonal intermittent machining test for aluminum alloy 5052 was conducted under dry conditions. By using cutting forces that were measured during the test, the frictional properties of a tool rake face were evaluated during intermittent machining for two types of diamond-like carbon (DLC)-coated tools and an uncoated carbide tool. DLC films used in the test were composed of tetrahedral amorphous carbon (ta-C) deposited by a filtered arc deposition process and hydrogenated amorphous carbon (a-C:H) deposited by a plasma-enhanced chemical vapor deposition process. The test results showed that the initial friction coefficients were approximately 0.8 for all tools. However, with increasing machining time, the friction coefficient of only the ta-C-coated tool decreased remarkably to a lower value of 0.3, whereas those of the a-C:H-coated tool and the uncoated carbide tool remained high. An electron probe micro analyzer (EPMA) analysis revealed an area where no aluminum adhered on the ta-C-coated tool rake face after intermittent machining. This area provided low frictional properties during intermittent machining. An X-ray photoelectron spectroscopy (XPS) analysis showed that the carbon bonding of the DLC film surface in this area had changed from the state before machining.

Ultra Low Friction of DLC Coating with Lubricant

The objective of this study was to find a trigger to make clear a mechanism of the ultra low friction by evaluating the friction property of DLC-DLC combination under lubrication with the simple fluid. The Pin-on-disc reciprocating and rotating sliding tests were conducted to evaluate the friction property. The super low friction property of pure sliding with the ta-C(T) pair coated by the filtered arc deposition process under oleic acid lubrication was found at the mixed lubrication condition. It was thought that the low share strength tribofilm composed of water and acid seemed to be formed on ta-C sliding interface. Additionally, the smooth sliding surface formed on ta-C(T) was seemed to be required to keep this tribofilm. Then, the super low friction was thought to be obtained by this superlubrication condition. Although the accurate and direct experimental data must be required to make clear this super low friction mechanism, the advanced effect obtained by the simple material combination is expected to be applied on the large industrial fields in near future.

Characterization of the Optical Properties and Composition of TiNxThin Films by Spectroscopic Ellipsometry and X-ray Photoelectron Spectroscopy

Thin films of TiNx with 0.34<x<1.19 were deposited on silicon substrates by a filtered arc deposition process. Spectroscopic ellipsometry (SE) in the energy region 1.5–3.5 eV was used to measure the optical properties of the films. X-ray photoelectron spectroscopy (XPS) was used to determine the relative atomic concentration and the chemical states of the elements. The dielectric function ε(ω) measured by ellipsometry gives the optical response of TiNx films and valuable information on their chemical composition, which is also verified by XPS. The plasma energy ωp of TiNx films was found to depend strongly on the N/Ti ratio and this is correlated with the value of x as determined by XPS and Rutherford backscattering spectroscopy (RBS). The results show that, via the calibration, spectroscopic ellipsometry may be used to estimate the stoichiometry of deposited TiNx films.

Characterization of the Optical Properties and Composition of TiNx Thin Films by Spectroscopic Ellipsometry and Xray Photoelectron Spectroscopy

Thin films of TiNx with 0.34<x<1.19 were deposited on silicon substrates by a filtered arc deposition process. Spectroscopic ellipsometry (SE) in the energy region 1.5–3.5 eV was used to measure the optical properties of the films. X-ray photoelectron spectroscopy (XPS) was used to determine the relative atomic concentration and the chemical states of the elements. The dielectric function ε(ω) measured by ellipsometry gives the optical response of TiNx films and valuable information on their chemical composition, which is also verified by XPS. The plasma energy ωp of TiNx films was found to depend strongly on the N/Ti ratio and this is correlated with the value of x as determined by XPS and Rutherford backscattering spectroscopy (RBS). The results show that, via the calibration, spectroscopic ellipsometry may be used to estimate the stoichiometry of deposited TiNx films.

Deposition of TiN, TiC, and TiO2 films by filtered arc evaporation

Abstract A filtered arc deposition process was used in the reactive deposition of macroparticle-free TiO 2 , TiN, and TiC films. The TiO 2 films were reactively deposited by arc evaporation of titanium in an oxygen atmosphere. The films deposited onto glass substrates heated to 350 °C had a rutile structure and a refractive index n 6.33 of 2.735 and extinction coefficient k 6.33 of 0.07. Films of TiN and TiC were prepared by reactive evaporation in nitrogen and methane respectively. The lattice parameters and preferred orientations of the deposited films were measured as a function of negative substrate bias. The films were characterized by microhardness measurements, X-ray photoelectron spectroscopy and X-ray diffraction.