Fan-out Diffractive Optical Elements Research Articles

Metasurface fan-out diffractive optical elements

Here we report the design and realization of dielectric fan-out diffractive optical elements (DOEs) operating in visible range and with nanobrick depth-width-ratio as low as 1.5. The metasurface-based fan-out DOEs realized here, when illuminated by an incident beam with 633 nm wavelength, the uniform 4×4 spot arrays with an extending angle of 32°×32° can be obtained in the far field. Experimental results agree well with the theoretical analysis and numerical simulation conclusions. Because of these advantages of the single-step nonstructural fabrication procedures, continuous and accurate phase manipulation, and strong polarization conversion, the metasurface-based fan-out DOEs could be utilized for various applications such as optical sensing, lidar, laser machining and so on.

Analysis of the resolution-bandwidth-noise trade-off in wavelength-based photonic analog-to-digital converters

The performance of wavelength-based photonic analog-to-digital converters (ADCs) is theoretically analyzed in terms of resolution and bandwidth as well as of noise tolerance. The analysis applies to any photonic ADC in which the analog input signal is converted into the wavelength of an optical carrier, but special emphasis is put on the spectrometerlike setup in which the wavelength is mapped to a spatial spot position. The binary output signals are then retrieved by an array of fan-out diffractive optical elements that redirect the beam onto the correct detectors. In particular, the case when the input signal controls the wavelength directly such that it will chirp in frequency during each sampling pulse or interval is studied. This chirping obviously broadens the spot on the diffractive optical element array; the effect of this broadening on noise tolerance and comparator accuracy is analytically analyzed, and accurate numerical calculations of the probability of error are presented.

Parallel dual-color fluorescence cross-correlation spectroscopy using diffractive optical elements

Dual-color cross-correlation spectroscopy allows the detection and quantification of labeled biomolecules at ultra-low concentrations, whereby the sensitivity of the assay correlates with the measurement time. We now describe a parallel multifocal dual-color spectroscopic configuration employing multiple avalanche photodiodes and hardware correlators. Cross-correlation curves are obtained from several dual-color excitation foci simultaneously. Multifocal dual-color excitation is achieved by splitting each of two laser beams (488 and 633 nm) into four sub-beams with the help of two 2x2 fan-out diffractive optical elements (DOEs), and subsequent superposition of the two sets of four foci. The fluorescence emission from double-labeled biomolecules is detected by two 2x2 fiber arrays.

Design of array of diffractive optical elements with inter-element coherent fan-outs

Building on the optimal-rotation-angle method, an algorithm for the design of inter-element coherent arrays of diffractive optical elements (DOEs) was developed. The algorithm is intended for fan-out DOE arrays where the individual elements fan-out to a sub-set of points chosen from a common set of points. By iteratively optimizing the array of elements as a whole the proposed algorithm ensures that the light from neighbouring elements is in-phase in all fan-out points that are common to neighbouring DOEs. This is important in applications where a laser beam scans the DOE array and the fan-out intensities constitute a read-out of information since the in-phase condition ensures a smooth transition in the read-out as the beam moves from one DOE to the next. Simulations show that the inter-element in-phase condition can be imposed at virtually no expense in terms of optical performance, as compared to independently designed DOEs.

Design and performance of multilevel phase fan-out diffractive optical elements for laser materials processing

A multilevel phase fan-out diffractive optical element (DOE) has been developed and introduced into various kinds of laser materials processing such as drilling, cutting, welding, and soldering. The larger the number of arrayed spots the DOE generates on the surface of the workpiece, the more sensitive the intensity uniformity of the spots becomes to fabrication errors, which are deviations between designed and fabricated surface microstructures. Errors in etch depth have, in particular, a significant effect on the intensity uniformity. A new design method has been developed for increasing the tolerance to the etch depth error, and applied to the design of a 16-level phase 7×7 fan-out element. The result indicates a uniformity less sensitive to etch depth error. The effect of a linewidth error due to the side etch introduced during a plasma etching process is also evaluated by computing high-resolution graphics data representing the phase of the DOE with the line width errors. Mask alignment errors, the slant of sidewalls, and other fabrication errors are discussed further. The diffraction efficiency and intensity uniformity are measured for fabricated DOE prototypes, and a comparison made between the calculated and measured properties shows good agreement.

Design Technique of Crossed Gratings for Beam Couplers in Large-Core Optical Fibers

We developed a novel design technique for multi-fanout diffractive optical elements (DOEs) with high diffraction efficiencies. This technique makes it possible to control both the diffraction directions and the beam power ratio for output beams. It easily provides phase distributions of DOEs without iterative calculation procedures. The design concept includes superimposing blazed gratings, which are equivalent to crossed gratings. This design technique provides DOEs with high diffraction efficiencies of more than 81% by computer simulations based on the Fraunhofer diffraction theory. The diffraction efficiency has its minimum value when a DOE has an even output-beam power ratio. We fabricated two fanout DOEs with a 1:16 output-beam power ratio by this technique. The measured diffraction efficiency is in good agreement with the simulation results of 88%. The DOEs realized by this technique may be suitable for large-core beam couplers with unequal output-beam power ratios.

Fan-out diffractive optical elements designed for increased fabrication tolerances to linear relief depth errors.

The intensity uniformity of the spots generated by fan-out diffractive optical elements (DOEs) (or kinoforms) is often highly sensitive to any fabrication error that leads to a deviation of the surface-relief depth of the DOE from its design value. Many of the fabrication errors, such as those that are due to insufficient control of development or etch rates, increase almost linearly with the desired relief depth in every position of the DOE. We present an algorithm for designing fan-out DOEs with a significantly reduced sensitivity of the intensity uniformity to such errors. The reduced sensitivity can be obtained without reducing the efficiency of the DOE. Experimental results for fabricated DOEs show that reduced sensitivity is also obtained in practice.

Continuous-relief diffractive optical elements for two-dimensional array generation

Continuous surface-relief diffractive optical elements for two-dimensional array generation (fan-out) are designed and fabricated. Separable and nonseparable solutions for the two-dimensional element design are compared. The phase-grating microstructures are generated by laser-beam writing lithography in a single exposure step and converted to nickel shims by electroplating, enabling low-cost replicas to be produced by using laboratory and commercial replication processes. Results are presented for a 9 x 9 fan-out diffractive optical element with a measured efficiency of 94% and an overall uniformity within +/-8%; replicas in epoxy have the same efficiency and a uniformity of +/-15%.