Journal Article Is It Feasible To Routinely Check The Dopant Profiling Via Off-Axis Electron Holography For An IC Failure Analysis Laboratory? Get access KW Lee, KW Lee Samsung Electronics Co, Hwasung-City, Gyeonggi-Do, Korea 449-711 Search for other works by this author on: Oxford Academic Google Scholar HJ Park, HJ Park Samsung Electronics Co, Hwasung-City, Gyeonggi-Do, Korea 449-711 Search for other works by this author on: Oxford Academic Google Scholar YC Wang, YC Wang FEI Company, Hillsboro, OR 97124 Search for other works by this author on: Oxford Academic Google Scholar BK Park, BK Park Samsung Electronics Co, Hwasung-City, Gyeonggi-Do, Korea 449-711 Search for other works by this author on: Oxford Academic Google Scholar Sean Da, Sean Da FEI Company, Hillsboro, OR 97124 Search for other works by this author on: Oxford Academic Google Scholar YN Kim, YN Kim Samsung Electronics Co, Hwasung-City, Gyeonggi-Do, Korea 449-711 Search for other works by this author on: Oxford Academic Google Scholar JS Kim, JS Kim Samsung Electronics Co, Hwasung-City, Gyeonggi-Do, Korea 449-711 Search for other works by this author on: Oxford Academic Google Scholar E Van Cappellen, E Van Cappellen FEI Company, Hillsboro, OR 97124 Search for other works by this author on: Oxford Academic Google Scholar SM Chon SM Chon Samsung Electronics Co, Hwasung-City, Gyeonggi-Do, Korea 449-711 Search for other works by this author on: Oxford Academic Google Scholar Microscopy and Microanalysis, Volume 9, Issue S02, 1 August 2003, Pages 774–775, https://doi.org/10.1017/S1431927603443870 Published: 21 July 2003