Extreme Ultraviolet Transmission Research Articles

New extreme ultraviolet transmission measurements of two thin-film filters for imaging of plasmaspheric cold ions

New extreme ultraviolet transmission measurements of two thin-film filters for imaging of plasmaspheric cold ions

Carbon nanotube EUV pellicle tunability and performance in a scanner-like environment

Background: An extreme ultraviolet (EUV)-transparent pellicle must be used during lithography to protect the photomask from fall-on particles. A pellicle made of free-standing carbon nanotube (CNT) films stops particles despite the presence of gaps while demonstrating high EUV transmission, mechanical stability, low EUV scattering and reflectivity, and DUV transmission that enables through-pellicle mask inspection. Aim: The CNT EUV pellicle properties can be tailored based on the diversity of CNT structures and tunability of their configuration within the CNT film (density, bundle size, composition, etc.) as shown in this work. A remaining challenge is extending the CNT EUV pellicle lifetime in the scanner environment of EUV-induced hydrogen-based plasma, and the effects on different CNT films are explored here. Approach: Optical and thermal properties of different CNT pellicles with respect to the CNT material type, density, composition, and bundle size were explored. The ability of uncoated CNT EUV pellicles to withstand high EUV powers in the hydrogen-based environment was tested. Transmission, spectroscopic, and chemical mapping of the exposed CNT membranes were performed to explore the material modifications under various exposure conditions. Results: Uncoated CNT pellicles withstand 600-W source power equivalent in the EUV scanner-like gas environment but exhibit structural changes with prolonged exposure. Multiwalled CNT pellicles exhibit less EUV transmission change as compared to single-walled CNT pellicles under the same exposure conditions. The protection of CNT material from structural degradation by means of coating was shown. Conclusions: These investigations add to the understanding of CNT EUV pellicle tunability for optimal performance and lifetime limiters of CNT pellicles under the influence of EUV radiation and plasma. We anticipate the need for coating the CNT pellicle to protect the CNT material against plasma damage for the current scanner conditions. Optimization of both the CNT membrane and its coating is in progress.

Carbon nanotube pellicles: imaging results of the first full-field extreme ultraviolet exposures

Extreme ultraviolet (EUV) lithography was recently implemented in high-volume wafer production. Consequently, maximizing yield is gaining importance. One key component to achieving optimal yield is using a pellicle to hold particles out of the focal plane and thereby minimizing the printing of defects. The carbon nanotube (CNT) pellicle is a membrane consisting of a network of CNTs with a demonstrated EUV transmission (EUV-T) of up to 98%. The challenge is balancing the CNT material parameters for optimal performance in the EUV scanner: low probability for particles to pass, low impact on imaging through scattered light, and high durability in the scanner environment, while maintaining high transmission. We report results of the first full-field CNT pellicle exposures on an EUV scanner. We demonstrate handling of the pellicles, without breakage, and provide a first assessment of their imaging behavior. Multiple single- and double-walled uncoated CNT pellicles with EUV-T of up to 97.7% were exposed on the EUV scanner at imec, and minimal impact on the imaging was confirmed. In these exposures, uncoated CNT pellicles that do not yet meet the specifications regarding lifetime were used. Therefore, ongoing developments focus on CNT durability in scanner environments. The presented demonstration proves the value of a CNT-based EUV pellicle solution.

Broadband extreme ultraviolet dispersion measurements using a high-harmonic source.

We demonstrate direct dispersion measurements of various thin films at extreme ultraviolet (EUV) wavelengths, using a table-top laser-driven high-harmonic generation (HHG) source. In this method, spatially separated identical EUV pulses are generated through HHG with a pair of phase-locked infrared pulses. The EUV pulses are re-imaged to a sample plane using a single toroidal mirror, such that one pulse illuminates the target thin film, while the other pulse passes through a reference aperture. By comparing the EUV interference with and without a sample, we are able to extract the dispersion properties of the sample, integrated over the full film thickness. We have measured thin films of titanium, nickel, copper, and silicon nitride, demonstrating that this technique can be applied to a wide range of materials, only requiring a film thin, enough for sufficient EUV transmission.

Free-standing carbon nanotube films for extreme ultraviolet pellicle application

To enable high volume manufacturing with extreme ultraviolet (EUV) lithography, a pellicle membrane is needed to protect the reticle from particles at EUV source powers beyond 250 W. Identifying a membrane with high EUV transmission, mechanical integrity, thermal stability, and chemical resistance to the scanner environment is extremely challenging; yet, these properties are required to realize next-generation EUV pellicle solutions. Free-standing carbon nanotube (CNT) film as an alternative next-generation core pellicle material is proposed. We demonstrate that free-standing CNT films possess very high EUV transmission (up to 99%) and good transmission uniformity (∼0.4 % half range), mechanical stability (maximum deflection ∼0.08 mm at 2 Pa), thermal stability (no transmission change under greater than 250 W equivalent EUV power in vacuum), and scalability to a full pellicle size (∼15 × 12 cm2). The capability of the CNT membrane to withstand high EUV power in the presence of H2 for a limited time is demonstrated. Other CNT membrane properties are presented that are important for the pellicle application: low EUV scattering, low EUV reflectivity, and sufficient transmission to enable through-pellicle inspection with DUV light or electrons. The ability of the CNT film to stop particles is tested. The influence of hydrogen at higher EUV powers and prolonged exposures on the lifetime of the CNT pellicle remains the current research focus. Approaches for coating the free-standing CNT films for protection are discussed.

Wide-field broadband extreme ultraviolet transmission ptychography using a high-harmonic source.

High-harmonic generation (HHG) provides a laboratory-scale source of coherent radiation ideally suited to lensless coherent diffractive imaging (CDI) in the EUV and x-ray spectral region. Here we demonstrate transmission extreme ultraviolet (EUV) ptychography, a scanning variant of CDI, using radiation at a wavelength around 29 nm from an HHG source. Image resolution is diffraction-limited at 54 nm and fields of view up to ∼100 μm are demonstrated. These results demonstrate the potential for wide-field, high-resolution, laboratory-scale EUV imaging using HHG-based sources with potential application in biological imaging or EUV lithography pellicle inspection.

Multistack structure for an extreme-ultraviolet pellicle with out-of-band radiation reduction

We report on out-of-band (OoB) radiation that can cause degradation to the image quality in extreme-ultraviolet (EUV) lithography systems. We investigated the effect of OoB radiation with an EUV pellicle and found the maximum allowable reflectivity of OoB radiation from the EUV pellicle that can satisfy certain criteria (i.e., the image critical dimension error, contrast, and normalized image log slope). We suggested a multistack EUV pellicle that can obtain a high EUV transmission, minimal reflectivity of OoB radiation, and sufficient deep ultraviolet transmission for defect inspection and alignment without removing the EUV pellicle in an EUV lithography system.

Protection of extreme ultraviolet lithography masks. II. Showerhead flow mitigation of nanoscale particulate contamination

An analysis is presented of a method to protect the reticle (mask) in an extreme ultraviolet (EUV) mask inspection tool using a showerhead plenum to provide a continuous flow of clean gas over the surface of a reticle. The reticle is suspended in an inverted fashion (face down) within a stage/holder that moves back and forth over the showerhead plenum as the reticle is inspected. It is essential that no particles of 10-nm diameter or larger be deposited on the reticle during inspection. Particles can originate from multiple sources in the system, and mask protection from each source is explicitly analyzed. The showerhead plate has an internal plenum with a solid conical wall isolating the aperture. The upper and lower surfaces of the plate are thin flat sheets of porous-metal material. These porous sheets form the top and bottom showerheads that supply the region between the showerhead plate and the reticle and the region between the conical aperture and the Optics Zone box with continuous flows of clean gas. The model studies show that the top showerhead provides robust reticle protection from particles of 10-nm diameter or larger originating from the Reticle Zone and from plenum surfaces contaminated by exposure to the Reticle Zone. Protection is achieved with negligible effect on EUV transmission. The bottom showerhead efficiently protects the reticle from nanoscale particles originating from the Optics Zone. With similar mass flow rates from the two showerheads, this system provides efficient protection even when a significant overpressure exists between the Optics Zone and the Reticle Zone. Performance is insensitive to the fraction of incident particles that sticks to walls, the accommodation coefficient, the aperture geometry, and the gas pressure. The showerheads also protect the aperture (and therefore the Optics Zone) during mask loading and unloading. Commercially available porous-metal media have properties suitable for these showerheads at the required flow rates. The benefits of the approach compared to a conceptual EUV pellicle are described.

Diagnosis of energy transport in iron buried layer targets using an extreme ultraviolet laser

We demonstrate the use of extreme ultra-violet (EUV) laboratory lasers in probing energy transport in laser irradiated solid targets. EUV transmission through targets containing a thin layer of iron (50 nm) encased in plastic (CH) after irradiation by a short pulse (35 fs) laser focussed to irradiances 3 × 1016 Wcm−2 is measured. Heating of the iron layer gives rise to a rapid decrease in EUV opacity and an increase in the transmission of the 13.9 nm laser radiation as the iron ionizes to Fe5+ and above where the ion ionisation energy is greater than the EUV probe photon energy (89 eV). A one dimensional hydrodynamic fluid code HYADES has been used to simulate the temporal variation in EUV transmission (wavelength 13.9 nm) using IMP opacity values for the iron layer and the simulated transmissions are compared to measured transmission values. When a deliberate pre-pulse is used to preform an expanding plastic plasma, it is found that radiation is important in the heating of the iron layer while for pre-pulse free irradiation, radiation transport is not significant.

Interplay of electron heating and saturable absorption in ultrafast extreme ultraviolet transmission of condensed matter

High intensity pulses obtained by modern extreme ultraviolet (EUV) and x-ray photon sources allows the observation of peculiar phenomena in condensed matter. Experiments performed at the Fermi@Elettra FEL-1 free-electron-laser source at 23.7, 33.5, and 37.5 eV on Al thin films, for an intermediate-fluence range up to about $20\phantom{\rule{0.28em}{0ex}}\mathrm{J}/{\mathrm{cm}}^{2}$, show evidence for a nonmonotonic EUV transmission trend. A decreasing transmission up to about $5--10\phantom{\rule{0.28em}{0ex}}\mathrm{J}/{\mathrm{cm}}^{2}$ is followed by an increase at higher fluence, associated with saturable absorption effects. The present findings are interpreted within a simplified three-channel model, showing that an account of the interplay between ultrafast electron heating and saturation effects is required to explain the observed transmission trend.

Scalability limits of Talbot lithography with plasma-based extreme ultraviolet sources

Lithography has been faced with a challenge to bring resolution down to the 10-nm level. One of the promising approaches for such ultra-high-resolution printing is self-imaging Talbot lithography with extreme ultraviolet (EUV) radiation. However, as the size of structures on the mask approaches the wavelength of the radiation, diffraction influence needs to be evaluated precisely to estimate the achievable resolution and quality of the patterns. Here, the results of finite-difference time-domain simulations of the diffraction on EUV transmission masks in dependence to the period (pitch) of the mask are presented with the aim to determine the resolution that can be realistically achieved with the EUV Talbot lithography. The modeled experimental setup is utilizing partially coherent EUV radiation with the wavelength of 10.9 nm from Xe/Ar discharge plasma EUV source and Ni/Nb-based amplitude transmission mask. The results demonstrate that the method can be used to produce patterns with resolution down to 7.5-nm half-pitch with 2∶1 mask demagnification utilizing achromatic Talbot effect and transverse electric (TE)-polarized light.

Zr/Mg multilayer mirror for extreme ultraviolet application and its thermal stability

Zr/Mg multilayer mirror was proposed for extreme ultraviolet (EUV) spectral range and deposited by magnetron sputtering. Its thermal stability during annealing up to 600 °C was evaluated by EUV reflection measurements, x-ray analyses, and transmission electron microscopy and found superior to that of Y2O3/Mg, SiC/Mg, and Co/Mg. The reflectance of as-deposited Zr/Mg multilayer is 30.6% at wavelength of 30.4 nm. The reflectance slightly decreases with annealing temperature when not above 500 °C and eventually drops to 15.1% at 600 °C. The degradation of performance is attributed to roughening induced by strain relaxation rather than interdiffusion or alloy compound formation.

Energy transport in short-pulse-laser-heated targets measured using extreme ultraviolet laser backlighting

The accurate characterization of thermal electron transport and the determination of heating by suprathermal electrons in laser driven solid targets are both issues of great importance to the current experiments being performed at the National Ignition Facility, which aims to achieve thermonuclear fusion ignition using lasers. Ionization, induced by electronic heat conduction, can cause the opacity of a material to drop significantly once bound-free photoionization is no longer energetically possible. We show that this drop in opacity enables measurements of the transmission of extreme ultraviolet (EUV) laser pulses at 13.9 nm to act as a signature of the heating of thin (50 nm) iron layers with a 50-nm thick parylene-N (CH) overlay irradiated by 35-fs pulses at irradiance 3×10(16) Wcm(-2). Comparing EUV transmission measurements at different times after irradiation to fluid code simulations shows that the target is instantaneously heated by hot electrons (with approximately 10% of the laser energy), followed by thermal conduction with a flux limiter of ≈0.05.

Efficient extreme ultraviolet transmission gratings for plasma diagnostics

We report on a theoretical study of free-standing phase transmission gratings for high-resolution extreme ultraviolet (EUV) and soft x-ray spectroscopy and investigate their properties. Designed for wavelengths between about 2 and 40 nm, the devices may provide a first order diffraction efficiency beyond 30%. We use rigorous coupled wave analysis methods in order to optimize the grating design parameters and discuss features of segmented grating arrays. Elemental, as well as compound, materials such as Be, Mo, LiF, and poly-(methylmethacrylate) are considered with respect to their potential and practical limitations in terms of feasibility and sensitivity to radiation damage. Simulations are performed for several samples on the radiation produced by a table-top EUV plasma source and applications to astrophysical problems are considered.

Performance results of laser-produced plasma test and prototype light sources for EUV lithography

Improved performance and specific results are reported for several test and prototype extreme ultraviolet (EUV) light sources developed for next-generation lithography. High repetition rate and high-power CO2 laser-produced plasma sources operating on tin droplet targets are described. Details of laser architecture, source chambers and system operation are given. Stable output power, efficient light collection, and clean EUV transmission could be achieved for hours of operation. We review progress during integration of light sources with collector mirrors reaching EUV power levels at intermediate focus of 60 W and 45 W, respectively, with duty cycles of 25% and 40%. Far-field EUV images of the collected light were recorded to monitor the source output performance during extended tests of collector longevity and debris protection with system operation time exceeding 50 h. Development results on EUV spectra, out-of-band (OOB) radiation, and ion debris obtained with dedicated metrology setups are also described. Angle-resolved measurements with ion energy analyzer and Faraday cups reveal the contributions of individual ion charge states in related spectra. Our laser-produced EUV light source technology has now reached a level of maturity in full integration where prototype sources can be delivered and pilot line introduction can be prepared.

Rotational effects in the band oscillator strengths and predissociation linewidths for the lowest Πu1–XΣg+1 transitions of N2

A coupled-channel Schrodinger equation (CSE) model of N2 photodissociation, which includes the effects of all interactions between the b, c, and o 1Pi u and the C and C' 3Pi u states, is employed to study the effects of rotation on the lowest-upsilon 1Pi u-X 1Sigmag+(upsilon,0) band oscillator strengths and 1Pi u predissociation linewidths. Significant rotational dependences are found which are in excellent agreement with recent experimental results, where comparisons are possible. New extreme-ultraviolet (EUV) photoabsorption spectra of the key b 1Pi u<--X 1Sigmag +(3,0) transition of N2 are also presented and analyzed, revealing a b(upsilon=3) predissociation linewidth peaking near J=11. This behavior can be reproduced only if the triplet structure of the C state is included explicitly in the CSE-model calculations, with a spin-orbit constant A approximately 15 cm(-1) for the diffuse C(upsilon=9) level which accidentally predissociates b(upsilon=3). The complex rotational behavior of the b-X(3,0) and other bands may be an important component in the modeling of EUV transmission through nitrogen-rich planetary atmospheres.

Exploring the ultimate resolution of positive-tone chemically amplified resists: 26 nm dense lines using extreme ultraviolet interference lithography

Interference lithography (IL) [Yen et al., Appl. Opt. 31, 2972 (1992)] based on reflective optics, and utilizing extreme ultraviolet (EUV) light from an electron storage ring, can be used to pattern structures with periods below 70 nm [Solak et al., Appl. Phys. Lett. 75, 2328 (1999); Ali et al., Microelectron. Eng. 65, 454 (2003)]. Previously achromatic interferometers with EUV transmission diffraction gratings were also used for this purpose [Wei et al., J. Vac. Sci. Technol. B 12, 3648 (1994)], and recently we have printed sub-50 nm high quality periodic structures in poly(methylmethacrylate) exposed with transmission-grating EUV interference lithography (EUV-IL) [Solak et al., Microelectron. Eng. 61, 77 (2002); Solak et al., ibid. 67-68, 56 (2003)]. With this technique, two-dimensional patterns are easily achievable using multiple diffraction gratings. Both types of EUV-IL have been implemented on one of the undulator beam lines at the University of Wisconsin-Madison Synchrotron Radiation Center electron storage ring because this undulator source provides a tunable and coherent beam of radiation well suited for IL studies. In this article, both exposure methods were applied to explore the ultimate resolution of two positive-tone chemically amplified resists supplied by the Shipley Corporation. We have demonstrated the printing of features as small as 26 nm line and space in Shipley XP9947W-100 resist. The present results demonstrate the fine quality of the above-mentioned EUV-IL techniques to test resist formulations for high-resolution patterning, and we provide the experimental setup and discuss the observed results.

Polarization performance of EUV transmission multilayers as λ/4 and λ/2 plates at a photon energy of 97 eV

Abstract Complex relative amplitude transmittance ρ = T p /T s of extreme ultraviolet transmission multilayers fabricated to three numbers of layers has been evaluated by ellipsometry with synchrotron radiation at a photon energy of 97 eV. Large phase shifts enough to be a quarter-wave plate and a half-wave plate have been observed with respective transmittances of 10 and 0.5%.

Extreme-ultraviolet polarization and filtering with gold transmission gratings

The polarization and transmission characteristics of freestanding gold transmission gratings, with 200-nm periods, for extreme-ultraviolet (EUV) radiation (1 < 200 nm) have been measured. We find that EUV transmission through the gratings is dominated by the waveguide characteristics of the gratings and that polarization efficiencies of 90% for wavelengths of 121.6 nm are achievable. Both the EUV polarization and transmission properties are in good agreement with a complete vector, numerical solution of Maxwell's equations. The fraction of open area to total area of the grating has been measured using a 10-keV proton beam and was found to be in good agreement with the microscopic slit and wire dimensions that were obtained by scanning electron microscopy. The use of these gratings for particle measurements in the presence of intense EUV radiation is briefly discussed.

Extreme ultraviolet transmission of a synthetic diamond thin film

The transmission of a thin film of synthetic diamond was measured at various wavelengths in the extreme ultraviolet. The measurements agree with a prediction based on published carbon attenuation coefficients assuming the density of natural diamond. A betterfit to the data results when an additional approximately 200-A layer of silicon is included in the model. It is believed that this silicon layer exists as silicon carbide.