EUV Range Research Articles

Study in the Extreme UV Range of the Spectral Transmission of Nickel Plasma Created under the Effect of an X-Ray Pulse of the Z-Pinch

Spectral properties of the high-temperature plasma obtained by exposing a nickel layer to a source of high-power X-ray radiation (a power of 6–10 TW with a duration of 7–10 ns) based on a Z-pinch, formed during implosion of tungsten multi-wire arrays at the Angara-5-1 facility, are studied. In this case, the Z-pinch radiation heats the target and turns it into the hot plasma, and the same radiation probes the target plasma to determine the spectral dependence of the transmission of this plasma. An original scheme is proposed for measuring the incident, transmitted and self-emission of a target simultaneously in one experiment in the frame mode using a grazing incidence diffraction spectrograph. Using laser shadow imaging, experimental data are obtained on the velocity of the plasma expansion on the irradiated and back sides of the target, which reached 100 km/s. Targets made of thin Ni layers deposited on a mylar film are studied. An irradiationinduced multiple increase in the transmission of the target plasma in the EUV range is observed compared to the transmittance of the target in the cold state. The dependence of the absorption spectrum of the plasma and the accompanying self-radiation of the target on the power and shape of the heating pulse is studied. The measurement results are compared with numerical calculations performed using the RALEF-2D two-dimensional radiation code, which has been repeatedly used previously to simulate similar experiments. The shape of the spectral dependence of the transmission in the experiment and calculation is similar in the range of ∼30–200 Å, but the model plasma transmission (∼0.8–0.9) is higher than that obtained using a spectrograph and X-ray multi-frame photography (∼0.5–0.6).

Spectroflat: A generic spectrum and flat-field calibration library for spectro-polarimetric data

Flat-fielding spectro-polarimetric data with one spatial and one spectral dimension is inherently difficult as the imprint of the spectral lines needs to be separated from other wavelength-dependent instrumental effect (e.g., fringes or prefilter profiles) and wavelength-independent effects (e.g., dust and sensor response). Current approaches for spectrometers are often based on moving the grating or they depend on optical models and/or on lab calibration data. They are also limited to small spectral regions and are instrument-specific. Approaches that would be suitable for polarimeters have not been reported yet. We present an approach that allows for flat-field calibration data to be to obtained for diffraction-grating-based, long-slit spectrographs combined with temporally modulated polarimetry from high-resolution solar telescopes. This approach is based on nominal flat-fielding procedures performed during the instrument's science operations. We performed a precise and field-dependent correction of the spectrographic distortion effect (resulting in curved spectral lines, typically denoted as a "smile" effect) to ensure the orthogonality of the spectral and spatial dimensions. We identified distortions by tracking the position of multiple spectral lines within the full spectral field of view. From the raw modulated flats, we then removed the solar line imprints and derived separate flat-fields for sensor and slit dust features. Optionally, wavelength calibration and continuum correction can be included in this process. We have created generic Python libraries that can be plugged into existing Python-based data reduction pipelines or used as a standalone calibration tool. We show that for spectrographs covering many spectral lines, a correction of the smile distortion based on optical models alone is not sufficient. Our results demonstrate a suppression of fringes, sensor artifacts, and fixed-pattern imprints in demodulated data by one order of magnitude. For intensity images, the photon noise level can be closely attained after calibration. Our correction works across the full spectral range. The algorithm was tested for different wavelength regimes with emission (EUV range) or absorption (near-UV, VIS, IR range) spectra, on data acquired with ground-based (SST/TRIPPLE-SP, GREGOR/GRIS), balloon-borne (SUNRISE-III/SUSI), and space-based (SolO/SPICE) instruments. The data calibrated with our method offer robust and precise inversion results. We have extended existing spectroscopic flat-field techniques to modern instruments with large imaging sensors covering many spectral lines simultaneously, and with polarimetric capabilities, where methods described so far are not adequate. We believe that our method is applicable as a standard calibration approach for most modern high resolution large-FOV, long-slit spectrographs -- both with and without polarimetric capabilities.

Collisional-radiative modeling and radiative emission of tungsten in tokamak plasmas in the temperature range (800–5000) eV

We present new collisional-modeling calculations of tungsten plasmas at electron density of about 5 × 1013 cm−3 and for electron temperatures in the range 0.8–5 keV. These conditions are relevant to current tokamaks. In this temperature range, the modeling of the ionization balance and of spectra is a long-standing problem. Addressing this problem is also useful for plasmas that will be produced in the future tokamak ITER. In particular, we discuss the problem of ensuring completeness of the list of configurations included in the calculations. We also discuss comparisons of experimental measurements in the EUV range performed in the WEST tokamak with synthetized spectra based on the use of the unresolved transition array and of the spin–orbit split array formalisms. While this work does not rely on a precise identification of detailed lines, modeled spectra display emission features that looks quite similar to the experimental spectra. A conclusion is that standard calculation methods used for the evaluation of the configuration average collisional and radiative rates, are fine provided that a convenient list of configurations is used in the calculations.

Fabrication and Soft-X-Ray and EUV Range Testing of Au- and Multilayer Mo/Si-Coated Diffraction Gratings with High-Order Blaze

Fabrication and Soft-X-Ray and EUV Range Testing of Au- and Multilayer Mo/Si-Coated Diffraction Gratings with High-Order Blaze

Mitigation of CSR induced spectral broadening in EEHG FEL

Externally seeded schemes have offered a major leap in improving the longitudinal coherence of FELs in the EUV and soft X-ray range. The Echo Enabled Harmonic Generation (EEHG) technique creates bunching at wavelengths of a few nanometers in two stages of longitudinal phase space manipulation, each consisting of an energy modulator and a chicane. Compared to other seeding techniques, EEHG is less sensitive to electron beam phase space distortions occurring during acceleration and compression. However the strong chicane needed in the first stage makes the system vulnerable to Coherent Synchrotron Radiation (CSR), which imprints a long-wavelength energy modulation on the electron bunch after the EEHG process has been initiated. Coupled with the second dispersive section, this modulation creates a position dependent change in the final bunching wavelength. In this work we show that tailoring the second seed laser wavelength can successfully compensate for the varying energy profile induced by CSR.

Methods for enhancing the steady-state microbunching in storage rings

Steady-state microbunching (SSMB) is a promising concept for generating high average power coherent radiation based on storage rings. To cover the shorter wavelength range, the bunched electron beam in conventional SSMB needs to be further compressed with advanced beam manipulation techniques. In this paper, several methods for enhancing the microbunching of SSMB have been discussed and compared. A new method termed dual-tilted-laser scheme (DTL) has been proposed. Numerical simulations with typical parameters of SSMB demonstrated that it has the potential of extending the wavelength coverage of SSMB to the EUV range based on DTL scheme with high repetition rate.

Система визуализации плазменного факела бетатронного источника рентгеновского излучения

The paper describes the design of a microscope for studying a betatron radiation source based on the PEARL femtosecond laser complex in the SXR and EUV wavelength range. The main optical element of the microscope is a spherical Schwarzschild objective a x5 magnification. The device allows to study the size and spatial structure of the interaction area of laser radiation with matter, at a selected wavelength in the EUV or SXR range with a resolution of δx = 2.75 microns. The operation wavelength (=13.5 nm) is set by multilayer X-ray mirrors. Thin-film absorption filters are used to suppress the background component of the signal.

Imaging system of a plasma torch of a Betatron X-ray source

The paper describes the design of a microscope for studying a betatron radiation source based on the PEARL femtosecond laser complex in the SXR and EUV wavelength range. The main optical element of the microscope is a spherical Schwarzschild objective a x5 magnification. The device allows to study the size and spatial structure of the interaction area of laser radiation with matter, at a selected wavelength in the EUV or SXR range with a resolution of delta x=2.75 μm. The operation wavelength (λ=13.5 nm) is set by multilayer X-ray mirrors. Thin-film absorption filters are used to suppress the background component of the signal. Keywords: SXR and EUV radiation, betatron radiation, imaging x-ray optics, SXR microscope.

Electron Impact Excitation of Extreme Ultra-Violet Transitions in Xe7–Xe10 Ions

In the present work, a detailed study on the electron impact excitation of Xe7+, Xe8+, Xe9+ and Xe10+ ions for the dipole allowed (E1) transitions in the EUV range of 8–19 nm is presented. The multi-configuration Dirac–Fock method is used for the atomic structure calculation including the Breit and QED corrections along with the relativistic configuration interaction approach. We have compared our calculated energy levels, wavelengths and transition rates with other reported experimental and theoretical results. Further, the relativistic distorted wave method is used to calculate the cross sections from the excitation threshold to 3000 eV electron energy. For plasma physics applications, we have reported the fitting parameters of these cross sections using two different formulae for low and high energy ranges. The rate coefficients are also obtained using our calculated cross sections and considering the Maxwellian electron energy distribution function in the electron temperature range from 5 eV to 100 eV.

Solar-Flux Variation in Helium Lines According to SDO/EVE Data in the 24th Cycle and the Forecast for Different Levels of Solar Activity. Lyman Decrements of Hydrogen and Helium Lines

The extreme ultraviolet radiation (EUV radiation) of the Sun is studied. The time series of daily values of the radiation fluxes outside flares in the EUV range are constructed based on the archive of daily Solar Dynamics Observatory/EUV Variability Experiment observations for 2010–2018. The fluxes in the lines of neutral helium He I (58.4 nm and 53.7 nm) and ionized helium He II (30.4 nm and 25.6 nm) are analyzed for the 24th activity cycle. The coefficients of quadratic regressions are calculated in order to restore the fluxes at different phases of the cycle. The decrement variation in the lines of neutral hydrogen and neutral and ionized helium during the 24th cycle and flares are considered.

Optical constants and absorption properties of Te and TeO thin films in the 13-14 nm spectral range.

Undesired mask-induced effects caused by thick absorber layers in EUV photomasks reduce the quality of the projected patterns at the wafer stage in EUV photolithography scanners. New materials with better absorption properties than the state-of-the-art absorbers, TaN and TaBN, are required to mitigate these effects. In this work, we investigated the optical properties (δ and k) of Te and TeO films in the 13-14 nm range, and the absorption properties of these two materials at 13.5 nm. δ and k are obtained through fitting experimental values of reflectivity versus angle of incidence in the EUV range. We follow a methodology which combines different characterization techniques (X-ray reflectivity, EUV reflectivity, and X-ray photoemission spectroscopy) to reduce the number of free parameters in models and hence, increase the reliability of the optical constants obtained. At 13.5 nm, we obtain δ=0.03120, k = 0.07338 for Te, and δ=0.04099, k = 0.06555 for TeO. To experimentally verify the absorption properties of these materials, different thicknesses of Te and TeO films are cast on top of a state-of-the-art mask-quality EUV multilayer with 66.7% reflectivity at 13.5 nm. We found that a reflectivity of ∼0.7% can be attained with either 32.4 nm of Te, or 34.7 nm of TeO, greatly surpassing the absorption properties of TaN and TaBN. The morphology and surface roughness of the Te and TeO films deposited on the multilayer are also investigated.

A scanning reflection X-ray microscope for magnetic imaging in the EUV range.

The mechanical setup of a novel scanning reflection X-ray microscope is presented. It is based on zone plate optics optimized for reflection mode in the EUV spectral range. The microscope can operate at synchrotron radiation beamlines as well as at laboratory-based plasma light sources. In contrast to established X-ray transmission microscopes that use thin foil samples, the new microscope design presented here allows the investigation of any type of bulk materials. Importantly, this permits the investigation of magnetic materials by employing experimental techniques based on X-ray magnetic circular dichroism, X-ray linear magnetic dichroism or the transversal magneto-optical Kerr effect (T-MOKE). The reliable functionality of the new microscope design has been demonstrated by T-MOKE microscopy spectra of Fe/Cr-wedge/Fe trilayer samples. The spectra were recorded at various photon energies across the Fe 3p edge revealing the orientation of magnetic domains in the sample.

Comparison of approaches in the manufacture of broadband mirrors for the EUV range: aperiodic and stack structures

We have developed the design and experimentally studied aperiodic and stack broadband Mo/Si mirrors for the purposes of the KORTES project, optimised for uniform reflection in the 17 – 21 nm wavelength range. It is shown that stack structures with an insignificant loss in the reflection coefficient are much more preferable from the point of view of manufacturing and certification, which, in turn, makes it possible to correct the deposition process and to reach the calculated parameters of a multilayer mirror in a small number of iterations.

Angular and Spectral Bandwidth of Extreme UV Multilayers Near Spacer Material Absorption Edges.

High resolution imaging systems for EUV range are based on multilayer optics. Current generation of EUV lithography uses broadband Sn LPP sources, which requires broadband mirrors to fully utilize the source power. On the other hand, there always remains a possibility to use FEL or synchrotron as EUV source. FEL can produce very bright narrowband EUV light of a tunable wavelength, and the spectral bandwidth of the mirror is no longer a restriction. In this paper we look at the consequences of switching to different wavelengths if FEL source is used. For instance, it is known that the reflectance of Mo/Si multilayers increases when approaching Si L-edge, and the spectral bandwidth drops. But the behavior of an angular bandwidth (and its relation with the spectral bandwidth) is usually left out. It is also sometimes assumed that these bandwidths are correlated. For a large aperture EUV optical system with diffraction-limited resolution angular acceptance of a mirror is also a very important parameter. We show that the angular bandwidth of several multilayer systems (Mo/Si, Mo/Be, Ru/Si, Ru/B, La/B) actually increases close to spacer absorption edges, opposite to what occurs with the spectral bandwidth. We study this effect and show that it is caused by an interplay of changing optical constants of respective materials used in these multilayer combinations. We also provide an experimental check of the angular bandwidth of Mo/Si multilayers at 13.5 and 12.6 nm, which confirms our calculations.

Absolutely Calibrated Spectrally Resolved Measurements of Xe Laser Plasma Radiation Intensity in the EUV Range

With the aid of Mo/Be and Si/Mo interference mirrors, measurements of radiation intensity from laser plasma with Xe gas-jet target have been realized within a wavelength interval of 11–14 nm with a spectral resolution of 3–6 A. The results are compared with the spectrum formerly measured with the aid of a spectrograph. The ratio of intensities at wavelengths of 11.2 and 13.5 nm has been found to be about 10 under experimental conditions studied.

Efficient high-order suppression system for a metrology beamline.

High-quality metrology with synchrotron radiation requires in particular a very high spectral purity of the incident beam. This is usually achieved by a set of transmission filters with suitable absorption edges to suppress high-order radiation of the monochromator. The at-wavelength metrology station at a BESSY-II bending-magnet collimated plane-grating monochromator (c-PGM) beamline has recently commissioned a high-order suppression system (HiOS) based on four reflections from mirrors which can be inserted into the beam path. Two pairs of mirrors are aligned parallel so as not to disturb the original beam path and are rotated clockwise and counter-clockwise. Three sets of coatings are available for the different energy ranges and the incidence angle is freely tunable to find the optimum figure of merit for maximum suppression at maximum transmission for each photon energy required. Measured performance results of the HiOS for the EUV and XUV range are compared with simulations, and applications are discussed.

Direct Observation of the M1 Transition between the Ground Term Fine Structure Levels of W VIII

We present a direct observation of the M1 transition between the fine structure splitting in the 4 f 13 5 s 2 5 p 6 2 F ground term of W VIII. The spectroscopic data of few-times ionized tungsten ions are important for the future ITER diagnostics, but there is a serious lack of data. The present study is part of an ongoing effort to solve this problem. Emission from the tungsten ions produced and trapped in a compact electron beam ion trap is observed with a Czerny–Turner visible spectrometer. Spectra in the EUV range are also observed at the same time to help identify the previously-unreported visible lines. The observed wavelength 574.47 ± 0.03 nm (air), which corresponds to the fine structure splitting of 17,402.5 ± 0.9 cm − 1 , shows reasonable agreement with the previously reported value 17,410 ± 5 cm − 1 obtained indirectly through the analysis of EUV spectra [Ryabtsev et al., Atoms 3 (2015) 273].

Effect of roughness, deterministic and random errors in film thickness on the reflecting properties of aperiodic mirrors for the EUV range

By the example of three aperiodic multilayer Mo/Si mirrors (AMM) for the wavelength ranges , and we have studied numerically the effect of the linearly determinisctic and random fluctuations of the film thickness and the interlayer roughness on the spectral dependences of the reflection coefficient. The simulation results are used to solve the inverse problem of reconstructing the interlayer roughness and the thickness of individual films from the measured dependences of the extreme UV radiation reflection coefficients. It is shown that the ‘asymmetry’ of the boundaries affects the magnitude and slope of the reflection coefficient plateau. Random fluctuations of the film thickness with the variance of 1 % – 2 % weakly influence the reflection characteristics of AMMs and allow reliable reconstruction of the thickness of individual films. The fluctuations with the variance 8 % – 10 % allow the estimation of individual thicknesses, but the reflection curve in this case strongly differs from the desirable one. Larger fluctuations do not allow the reconstruction of the AMM structure. The basic criteria for high-quality AMM synthesis are formulated.

极紫外与软X射线用非晶碳膜全反射镜的研究

极紫外与软X射线用非晶碳膜全反射镜的研究

Tungsten spectroscopy in the EUV range observed at a high-temperature superconducting electron-beam ion trap

We have recorded extreme ultraviolet spectra from ${\mathrm{W}}^{11+}$ to ${\mathrm{W}}^{15+}$ ions using a flat-field spectrometer installed at the Shanghai high-temperature superconducting electron-beam ion trap. The spectra were recorded at beam energies ranging between 200 and 400 eV and showed spectral lines and transition arrays in the 170--260 \AA{} region. The charge states and spectra transitions were identified by comparison with calculations using a detailed relativistic configuration interaction method and collisional-radiative model, both incorporated in the flexible atomic code. Atomic structure calculations showed that the dominant emission arises from $5d$ $\ensuremath{\rightarrow}$ $5p$ and $5p$ $\ensuremath{\rightarrow}$ $5s$ transitions. The work also identified the ground-state configuration of ${W}^{13+}$ as $4{f}^{13}5{s}^{2}$ both theoretically and experimentally.