Particle Beam Mass Spectrometer (PBMS) is a mass analyzer based particle sizer, features a few to hundreds of nanometer (nm) sizing capabilities in environmental pressures above hundreds of mTorr. The above feature makes the PBMS be used as in-situ process monitoring schemes for several kinds of semiconductor process equipment (e.g. Chemical Vapor Deposition). However, it still cannot be used in other process equipment (e.g. Plasma etching, Ion implantation) which requires lower process pressure conditions than the PBMS operation limits. The bottleneck of pressure limits comes from an aerodynamic lens component, which focuses incoming particles in background gas using repetitive fluidic contraction and expansion effects. These effects hard to be happened when the target particles are surrounded in molecular or transition background gas regions. In order to lower the operating pressure limits, other focusing schemes are required.In this study, an alternative particle focusing scheme which uses AC and DC electric field effects is proposed. The proposed scheme uses a stacked-ring ion funnel structure with variable AC and DC electric sources, for driving AC and DC potential variations along the funnel’s axial direction. While radial electric potential wells produced by AC frequency components induce particles’ radial position concentration to the funnel axis center, potential well depth and axial well depth steepness is controlled by AC amplitudes and DC source values.Simulation results show that with the proposed scheme, more than 50% of particle transmission efficiencies are obtained for 5 nm – 100 nm sized charged particles moving with Maxwellian velocities in molecular background region. The results come from AC electric sources with 200 Hz - 20 kHz frequency ranges and within 50 V amplitude ranges, and DC electric sources within 50 V ranges which are feasible values for hardware implementation.
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