Direct Electron Beam Lithography Research Articles

3D designing of resist membrane pores via direct electron beam lithography

Formation of fluidic channels with well-defined size and shape is of critical importance for reliable resistive pulse sensing of individual objects in electrolyte solution. Here we report on a method to fabricate a pore of 3D-controlled structure. We directly sculpted a hole in a polymer resist membrane of various thickness up to 6 µm by electron beam lithography. This procedure allowed to create diverse range of thickness-to-diameter aspect ratio channels of controllable shapes from concave to convex cone profiles via the varying proximity effects under different electron dose conditions. The lithographically-defined pores were utilized to detect nanoparticles by cross-membrane ionic current that revealed optimal membrane thickness for gaining larger resistive pulse signal intensities. The present technique provides a way to design single-particle sensors for cell sorting and viral screening.

Multicolor Patterning of 2D Semiconductor Nanoplatelets.

Nanocrystal micro/nanoarrays with multiplexed functionalities are of broad interest in the field of nanophotonics, cellular dynamics, and biosensing due to their tunable electrical and optical properties. This work focuses on the multicolor patterning of two-dimensional nanoplatelets (NPLs) via two sequential self-assembly and direct electron-beam lithography steps. By using scanning electron microscopy, atomic force microscopy, and fluorescence microscopy, we demonstrate the successful fabrication of fluorescent nanoarrays with a thickness of only two or three monolayers (7-11 nm) and a feature line width of ∼40 nm, which is three to four NPLs wide. To this end, first, large-area thin films of red-emitting CdSe/ZnyCd1-yS and green-emitting CdSe1-xSx/ZnyCd1-yS core/shell NPLs are fabricated based on Langmuir-type self-assembly at the liquid/air interface. By varying the concentration of ligands in the subphase, we investigate the effect of interaction potential on the film's final characteristics to prepare thin superlattices suitable for the patterning step. Equipped with the ability to fabricate a uniform superlattice with a controlled thickness, we next perform nanopatterning on a thin film of NPLs utilizing a direct electron-beam lithography (EBL) technique. The effect of acceleration voltage, aperture size, and e-beam dosage on the nanopattern's resolution and fidelity is investigated for both of the presented NPLs. After successfully optimizing EBL parameters to fabricate single-color nanopatterns, we finally focus on fabricating multicolor patterns. The obtained micro/nanoarrays provide us with an innovative experimental platform to investigate biological interactions as well as Förster resonance energy transfer.

Arrays of Sub-Terahertz Cryogenic Metamaterial

Integrated quasi-optical cryogenic terahertz receivers contain arrays of detectors, quasi-optical filters, interferometers, and other metamaterials. Matrices of quasi-optical band-pass, low-pass, and high-pass filters, Fabry–Perot grid interferometers, and arrays of half-wave and electrically small antennas with superconductor-insulator-normal metal-insulator-superconductor (SINIS) sub-terahertz wavelength range detectors were fabricated and experimentally studied on the same computational, technological, and experimental platform. For the design of the filters, we used the periodic frequency-selective surfaces (FSS) approach, contrary to detector arrays that can be presented in a model of distributed absorbers. The structures were fabricated using direct electron beam lithography, thermal shadow evaporation, lift-off, alternatively magnetron sputtering, and chemical and plasma etching. The numerical simulation methods of such structures are sufficiently different: for the reactive matrices with low losses, the approximation of an infinite structure with periodic boundary conditions is applicable, and for the arrays of detectors with dissipative elements of absorbers, a complete analysis of the finite structure with hundreds of interacting ports is applicable. The difference is determined by the presence of dissipation in the detector arrays, the phase of the reflected or re-emitted signal turned out to be undefined and the Floquet periodic boundary conditions are correct only for a phased array antenna. The spectral characteristics of the created filters, interferometers, and antenna arrays were measured in the frequency range 50–600 GHz.

Irradiation-driven molecular dynamics simulation of the FEBID process for Pt(PF3)4.

This paper presents a detailed computational protocol for the atomistic simulation of formation and growth of metal-containing nanostructures during focused electron beam-induced deposition (FEBID). The protocol is based upon irradiation-driven molecular dynamics (IDMD), a novel and general methodology for computer simulations of irradiation-driven transformations of complex molecular systems by means of the advanced software packages MBN Explorer and MBN Studio. Atomistic simulations performed following the formulated protocol provide valuable insights into the fundamental mechanisms of electron-induced precursor fragmentation and the related mechanism of nanostructure formation and growth using FEBID, which are essential for the further advancement of FEBID-based nanofabrication. The developed computational methodology is general and applicable to different precursor molecules, substrate types, and irradiation regimes. The methodology can also be adjusted to simulate the nanostructure formation by other nanofabrication techniques using electron beams, such as direct electron beam lithography. In the present study, the methodology is applied to the IDMD simulation of the FEBID of Pt(PF3)4, a widely studied precursor molecule, on a SiO2 surface. The simulations reveal the processes driving the initial phase of nanostructure formation during FEBID, including the nucleation of Pt atoms and the formation of small metal clusters on the surface, followed by their aggregation and the formation of dendritic platinum nanostructures. The analysis of the simulation results provides spatially resolved relative metal content, height, and growth rate of the deposits, which represents valuable reference data for the experimental characterization of the nanostructures grown by FEBID.

Room Temperature Direct Electron Beam Lithography in a Condensed Copper Carboxylate.

High-resolution metallic nanostructures can be fabricated with multistep processes, such as electron beam lithography or ice lithography. The gas-assisted direct-write technique known as focused electron beam induced deposition (FEBID) is more versatile than the other candidates. However, it suffers from low throughput. This work presents the combined approach of FEBID and the above-mentioned lithography techniques: direct electron beam lithography (D-EBL). A low-volatility copper precursor is locally condensed onto a room temperature substrate and acts as a positive tone resist. A focused electron beam then directly irradiates the desired patterns, leading to local molecule dissociation. By rinsing or sublimation, the non-irradiated precursor is removed, leaving copper-containing structures. Deposits were formed with drastically enhanced growth rates than FEBID, and their composition was found to be comparable to gas-assisted FEBID structures. The influence of electron scattering within the substrate as well as implementing a post-purification protocol were studied. The latter led to the agglomeration of high-purity copper crystals. We present this as a new approach to electron beam-induced fabrication of metallic nanostructures without the need for cryogenic or hot substrates. D-EBL promises fast and easy fabrication results.

Nanopatterning of Weak Links in Superconducting Oxide Interfaces.

The interface between two wide band-gap insulators, LaAlO and SrTiO (LAO/STO), hosts a quasi-two-dimensional electron gas (q2DEG), two-dimensional superconductivity, ferromagnetism, and giant Rashba spin-orbit coupling. The co-existence of two-dimensional superconductivity with gate-tunable spin-orbit coupling and multiband occupation is of particular interest for the realization of unconventional superconducting pairing. To investigate the symmetry of the superconducting order parameter, phase sensitive measurements of the Josephson effect are required. We describe an approach for the fabrication of artificial superconducting weak links at the LAO/STO interface using direct high-resolution electron beam lithography and low-energy argon ion beam irradiation. The method does not require lift-off steps or sacrificial layers. Therefore, resolution is only limited by the electron beam lithography and pattern transfer. We have realized superconducting weak links with a barrier thickness of 30–100 nm. The barrier transparency of the weak links can be controlled by the irradiation dose and further tuned by a gate voltage. Our results open up new possibilities for the realization of quantum devices in oxide interfaces.

Direct X-ray and electron-beam lithography of halogenated zeolitic imidazolate frameworks.

Metal-organic frameworks (MOFs) offer disruptive potential in micro- and optoelectronics because of the unique properties of these microporous materials. Nanoscale patterning is a fundamental step in the implementation of MOFs in miniaturized solid-state devices. Conventional MOF patterning methods suffer from low resolution and poorly defined pattern edges. Here, we demonstrate the resist-free, direct X-ray and electron-beam lithography of MOFs. This process avoids etching damage and contamination and leaves the porosity and crystallinity of the patterned MOFs intact. The resulting high-quality patterns have excellent sub-50-nm resolution, and approach the mesopore regime. The compatibility of X-ray and electron-beam lithography with existing micro- and nanofabrication processes will facilitate the integration of MOFs in miniaturized devices.

Universal direct patterning of colloidal quantum dots by (extreme) ultraviolet and electron beam lithography.

Colloidal quantum dots have found many applications and patterning them on micro- and nanoscale would open a new dimension of tunability for the creation of smaller scale (flexible) electronics or nanophotonic structures. Here we present a simple, general, one-step top-down patterning technique for colloidal quantum dots by means of direct optical or electron beam lithography. We find that both photons and electrons can induce a solubility switch of both PbS and CdSe quantum dot films. The solubility switch can be ascribed to cross-linking of the organic ligands, which we observe from exposure with deep-UV photons (5.5 eV) to extreme-UV photons (91.9 eV), and low-energy (3-70 eV) as well as highly energetic electrons (50 keV). The required doses for patterning are relatively low and feature sizes can be as small as tens of nanometers. The luminescence properties as well as carrier lifetimes remain similar after patterning.

Direct Wavelength-Selective Optical and Electron-Beam Lithography of Functional Inorganic Nanomaterials.

Direct optical lithography of functional inorganic nanomaterials (DOLFIN) is a photoresist-free method for high-resolution patterning of inorganic nanocrystals (NCs) that has been demonstrated using deep UV (DUV, 254 nm) photons. Here, we expand the versatility of DOLFIN by designing a series of photochemically active NC surface ligands for direct patterning using various photon energies including DUV, near-UV (i-line, 365 nm), blue (h-line, 405 nm), and visible (450 nm) light. We show that the exposure dose for DOLFIN can be ∼30 mJ/cm2, which is small compared to most commercial photopolymer resists. Patterned nanomaterials can serve as highly robust optical diffraction gratings. We also introduce a general approach for resist-free direct electron-beam lithography of functional inorganic nanomaterials (DELFIN) which enables all-inorganic NC patterns with feature size down to 30 nm, while preserving the optical and electronic properties of patterned NCs. The designed ligand chemistries and patterning techniques offer a versatile platform for nano- and micron-scale additive manufacturing, complementing the existing toolbox for device fabrication.

Nanoscale Patterning of Colloidal Nanocrystal Films for Nanophotonic Applications Using Direct Write Electron Beam Lithography.

The small size of colloidal nanocrystal quantum dots (QDs) leads to a variety of unique optical properties that are well-suited to nanophotonics, including bright, tunable photoluminescence (PL). However, exploring the properties of solid QD assemblies at the nanoscale has proven challenging because of the limitations in the nanoscale QD patterning methods. Generally, the precise placement of QD solids is difficult to achieve, especially for tall structures with multiple QD layers, and when it is achieved the patterns often cannot withstand the further processing steps required for final device construction. Direct electron beam lithography of QDs has emerged as a straightforward patterning process that does not require ligand exchange and results in structures that retain bright PL. Here, we demonstrate that direct patterning QD films on substrates treated with a self-assembled monolayer of octadecyltrichlorosilane allows us to create feature sizes as thin as 30 nm with heights of multiple layers and characterize the pattern resolution, robustness, and placement accuracy. These structures withstand sonication in a variety of solvents, and the structures are placed within 20 nm of their intended location nearly 100% of the time. We further show how this patterning method can be applied to nanophotonics by measuring the complex refractive index of the QD materials to model the absorption and scattering cross sections of QD structures of various sizes and shapes. These simulations reveal that edge effects arising from the finite shape of the QD nanostructure lead to substantial absorption enhancement when compared to an equivalent volume region taken from a continuous QD film. Finally, we explore more complex structures by patterning QD arrays, multilayer QD structures, and QD disks inside plasmonic resonators.

Numerical simulation of hollow waveguide arrays as polarization converting elements and experimental verification

In this paper we study the characteristics of hollow waveguides that are used as polarization converting elements. In particular, numerical simulations are compared with experiments where a good agreement is found. The numerical simulations are performed with the Method of Lines—an eigenmode propagation algorithm where the eigenmodes are computed after a discretization in the cross-section. Due to the vectorial 3D-problem, extensions of the standard algorithm were required to keep the numerical effort low. Particularly, only a reduced set of eigenmodes is used in the computations and inverting rectangular matrices is done with the help of left eigenvectors. Further, it is shown how these left eigenvectors can be determined with simple matrix vector products, i.e., at very low numerical cost. The fabrication of the device is very demanding because of a very high ratio between the metal width and its height. Here, direct electron-beam lithography is used for this task.

Nanopatterning of mobile lipid monolayers on electron-beam-sculpted Teflon AF surfaces.

Direct electron-beam lithography is used to fabricate nanostructured Teflon AF surfaces, which are utilized to pattern surface-supported monolayer phospholipid films with 50 nm lateral feature size. In comparison with unexposed Teflon AF coatings, e-beam-irradiated areas show reduced surface tension and surface potential. For phospholipid monolayer spreading experiments, these areas can be designed to function as barriers that enclose unexposed areas of nanometer dimensions and confine the lipid film within. We show that the effectiveness of the barrier is defined by pattern geometry and radiation dose. This surface preparation technique represents an efficient, yet simple, nanopatterning strategy supporting studies of lipid monolayer behavior in ultraconfined spaces. The generated structures are useful for imaging studies of biomimetic membranes and other specialized surface applications requiring spatially controlled formation of self-assembled, molecularly thin films on optically transparent patterned polymer surfaces with very low autofluorescence.

Formation of ferroelectic domain stuctures in LiTaO3 crystals formed by direct electron-beam repolarization

The process of repolarization of LiTaO3 ferroelectric crystal by direct electron-beam lithography is studied. The possibility is considered of the formation of a domain structure with domain size ∼1 μm. It has been shown that in the 127° Y′-cross section of the LiTaO3 crystal ferroelectric domains form at an angle of 37° to the crystal surface and they grow from the negative surface to the positive along the polar Z-axis.

Design and experimental investigation of highly efficient resonance-domain diffraction gratings in the visible spectral region

Surface-relief resonance-domain diffraction gratings with deep and dense grooves provide considerable changes in light propagation direction, wavefront curvature, and nearly 100% Bragg diffraction efficiency usually attributed only to volume optical holograms. In this paper, we present design, computer simulation, fabrication, and experimental results of binary resonance-domain diffraction gratings in the visible spectral region. Performance of imperfectly fabricated diffraction groove profiles was optimized by controlling the DC and the depth of the grooves. Indeed, more than 97% absolute Bragg diffraction efficiency was measured at the 635nm wavelength with binary gratings having periods of 520nm and groove depths of about 1000nm, fabricated by direct electron-beam lithography and reactive ion etching.

Bragg waveguide ultrasound detectors

Polymer Bragg grating waveguides (BGWs) are demonstrated as ultrasound detectors. The device is fabricated by a direct electron beam lithography technique using an epoxy-based photoresist as the core material, with grating features fabricated on the side walls of the rib waveguide. The main motivation for this design is the linear geometry of the device, which can be used in a linear array, facilitating high-frequency ultrasound imaging. The fabricated BGW device has a cross-sectional area of 1.5 × 1.5 μm and the grating length is 500 μm. The optical resonance spectrum is measured and compared with a theoretical model. The BGW device is experimentally demonstrated for the detection of ultrasound waves emitted by a 25-MHz transducer. Detection sensitivity depends on optimal grating design for a steep resonance. The extension of a single-element BGW device to a linear array using optical wavelength division multiplexing is presented. The results demonstrate the potential use of BGW devices in highly compact array of optoacoustic detectors for high-sensitivity ultrasound detection and photoacoustic imaging.

Photonic crystal waveguides by direct writing of e-beam on self-assembled photonic crystals

Direct electron beam lithography technique is used for writing a variety of waveguide structures on thin films of polymethyl methacrylate (PMMA) and self-assembled three-dimensionally ordered photonic crystals made up of PMMA colloidal spheres. The waveguide structures fabricated on both these type of samples are characterized by scanning electron microscope and optical microscope images.

Fabrication of GMRF Structure on Glass Substrates by Direct Electron Beam Lithography

not Available.

Direct patterning of quantum dot nanostructures via electron beam lithography

Patterned quantum dot (QD) nanostructures were prepared by direct electron beam lithography on QD films. Time resolved photoluminescence measurements show that the optical properties of these QDs were retained after cross-linking.

Simulation of shot noise effect on CD and LER of electron-beam lithography in 32 nm designs

Mask fabrication or even maskless lithography operations are performed with electron-beam lithography (EBL). The detailed understanding of the electron scattering mechanisms in resist films and multilayer substrates, as well as on substrates with topography is mandatory. Along the same track the problem of line edge roughness (LER) of created structures is emerging, because it strongly affects the device electrical behavior. Process simulation could be used for the quantification of the effects of electron-beam exposure and resist material on the produced layout. In the current work coupling between a detailed Monte-Carlo e-beam–matter interaction simulator and a stochastic resist film modeling simulator for the materials, postexposure bake, and development allows for simulation of the shot noise, resist material, and process effects on the critical dimension (CD) and LER in the 32 technology patterned by direct EBL. An example of quantification of shot noise and resist contribution to LER is provided.

Label-free continuous cell sorter with specifically adhesive oblique micro-grooves

We report the development of a label-free continuous cell sorting method based on specific adhesivity between cells and surface-immobilized adhesion molecules. The separation of cells is induced by cross-flow adhesive force on micron-sized stripes with adhesion molecules immobilized on the surface. In order to accurately form the adhesive stripes on a microchannel wall, 1 µm wide micro-grooves are fabricated at a certain angle with respect to the flow direction using direct electron-beam lithography. Amino-functionalized parylene is used as the groove surface material, and streptavidin is immobilized on the entire surface, resulting in a surface with periodic adhesive patterns. The effectiveness of the proposed cell sorting principle is verified by flow-through experiments using functionalized particles as model cells. Measurements of the motion of biotin-coated microparticles show that the particles decelerated by specific adhesivity are displaced in the cross-flow direction. The observed cross-flow displacement is around 0.8% of the streamwise travelling distance. It is also shown that the rate of cross-flow displacement is independent of the flow rate or the stripe angle. Finally, it is demonstrated that a mixture of streptavidin- and biotin-coated microparticles can be completely separated after flowing over a 20 mm long patterned surface. The proposed label-free continuous lateral separation scheme has a wide range of potential applications for separation of cells which could not be distinguished by size or separated using dielectric forces.