The characterization of fatigue fracture mechanics in gold-MEMS notched specimens is presented in this work. A test microstructure with a central notched specimen is specifically designed and built to perform on-chip fatigue test. The central specimen undergoes cyclic loading due to the application of alternating voltage. The variation in the microstructure deflection is measured using an optical profilometer and is attributed to the crack growth in the gold material, causing the variation in the specimen stiffness. The occurrence of pull-in condition is used as a fracture detector, then the fracture of the specimen can be recognized without performing scanning electron microscope inspections during the fatigue test. Crack propagation in the test specimen is simulated through a coupled-field electromechanical fracture finite element model and the resulting crack path is compared to the experimental measurments performed with scanning electron microscope analyses. Finally, Paris’ law is applied and the number of cycles to failure is computed by exploiting the results of the fracture model and experimental measurements. Both experimental and numerical results demonstrate that the notch acts as a stress and strain raiser, fostering crack nucleation, and that the linear elastic fracture mechanics theory is still valid to describe crack propagation in micro-size samples.