Mesoporous abrasive particles exhibit superior chemical mechanical polishing/planarization (CMP) performance, as compared with the corresponding bulk materials. Nevertheless, the lack of control over the shape and particle size or distribution extremely restricts the development of mesoporous abrasives and their potential applications. To overwhelm these drawbacks, pure and ytterbium-doped mesoporous ceria (mCeO2 and mCeYbO2) spheres with well-defined morphology and good uniformity were synthesized via a straightforward nanocasting strategy using high-quality mesoporous silica spheres as hard templates and metal nitrates as precursors. The resulting samples were characterized by X-ray diffraction, scanning electron microscopy, transmission electron microscopy, selected area electron diffraction, X-ray photoelectron spectroscopy, Raman spectroscopy, UV–vis diffuse reflectance spectroscopy, photoluminescence spectroscopy, Zeta potential, and N2 adsorption-desorption measurements. The as-prepared mCeO2 and mCeYbO2 products exhibited enriched surface defects (trivalent Ce, vacancy oxygen, hydroxyls) and polycrystalline porous frameworks with a surface area of up to 160 m2/g and pore size of 4–7 nm. Benefiting from these synergistic attributes, the flexible and defective particle abrasives enabled significant improvements in both surface quality and removal efficiency during oxide-CMP, as compared to commercial CeO2. A possible CMP mechanism was proposed on the basis of the physical contact state, adsorption and adhesion behavior, as well as tribochemical interaction occurred at CeO2–SiO2 interfaces. This work demonstrates highly promising abrasive materials advancement combining architecture and defect engineering towards high-performance oxide-CMP.
Read full abstract