Conventional display panels could be replaced by OLED displays, which are a leading and popular technology in display industry. While OLEDs are quite stretchable, they are vulnerable to oxygen and moisture, and currently, there is no proper barrier film that can protect them from these elements while also maintaining high stretchability. In this study, a horizontally patterned organic/inorganic layer that can increase the stretchability of the film while also providing the necessary protection is proposed. The final structure of the thin film will consist of two layers: a stripe-patterned organic/inorganic layer created using area-selective ALD/MLD processes, followed by an organic layer.To achieve the research objectives, the degree of infiltration of the inorganic layer into the organic layer is crucial. In this study, the mechanism behind the generation of the interface layer between alumina and polyurea is investigated. Trimethylaluminum (TMA) and H2O were used as precursors for fabricating alumina by ALD, while 1,4-phenylene diisocyanate (PPDI) and ethylene diamine (ED) were used for fabricating polyurea by MLD. The porous structure of the polymer allows ALD precursors to spread into it. During TMA pulsing on the polymer layer, the degree of infiltration is affected by the type of chemical bond in the polymer. Previous research has shown that TMA precursors are more likely to infiltrate polymers with C=O bonds into the polymer layer. Therefore, polyurea, which contains a carbonyl functional group (-C(=O)-), is suitable for this research. While the conditions for polyurea MLD are fixed, five chamber temperature conditions for depositing alumina were selected: 30℃, 50℃, 70℃, 90℃, and 110℃. Alumina was deposited by ALD on 30nm of polyurea which was deposited on a Si wafer.From X-ray reflectivity (XRR) data, it was observed that three main types of thin films were formed. As the temperature increased, the density and thickness of the alumina layer forming the thin film changed. To verify the change in the alumina thin film, FTIR and XPS were used to compare the peaks representing the bonds of Aluminum and Oxygen.