Although magnetized plasmas have been frequently used to enhance the process rate or improve the film quality via the control of ion flux as well as energy and plasma density in semiconductor processes, the inhomogeneous magnetic field—which leads to plasma non-uniformity—remains as a problem to be solved. To address this problem, it is essential to conduct a comprehensive assessment of the magnetic effect throughout the entire discharge. Therefore, in the present study, we investigated the magnetic field effects (B < 100 G) on a capacitively-coupled nitrogen plasma based on spectroscopic analyses. The spatially-resolved emission spectra were measured along the radial direction at various vertical positions under the pressures of 10 mTorr and 250 mTorr both with and without magnetic field. By analyzing emission spectra such as N2 FPS, N2 SPS, N2+ FNS, and N I, we were able to obtain the radial distributions of reactive species density, vibrational temperature, and excitation temperature. In low-pressure plasma, with the application of a magnetic field, maximum increases in vibrational temperature and excitation temperature of 462 K and 491 K, respectively, were observed within the bulk region beneath the magnet. This magnetic effect resulted in a significant increase in reactive species density along the radial direction. It was also found that the local enhancement of ion density by magnetic field was strongly related to the increase in excitation temperature and the density of the N2+(B) state. From this result, it is suggested that introducing an asymmetric magnetic field could modulate the spatial distributions of the physical and chemical properties of the plasma.
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