Construction Of Band Diagram Research Articles

Direct Silicon Heterostructures With Methylammonium Lead Iodide Perovskite for Photovoltaic Applications

We investigated the formation of photovoltaic (PV) devices using direct n-Si/MAPI (methylammonium lead tri-iodide) two-sided heterojunctions for the first time (as a possible alternative to two-terminal tandem devices) in which charge might be generated and collected from both the Si and MAPI. Test structures were used to establish that the n-Si/MAPI junction was photoactive and that spiro-OMeTAD acted as a “pinhole blocking” layer in n-Si/MAPI devices. Two-terminal “substrate” geometry devices comprising Al/n-Si/MAPI/spiro-OMeTAD/Au were fabricated and the effects of changing the thickness of the semitransparent gold electrode and the silicon resistivity were investigated. External quantum efficiency and capacitance-voltage measurements determined that the junction was one-sided in the silicon-and that the majority of the photocurrent was generated in the silicon, with there being a sharp cutoff in photoresponse above the MAPI bandgap. Construction of band diagrams indicated the presence of an upward valence band spike of up to 0.5 eV at the n-Si/MAPI interface that could impede carrier flow. Evidence for hole accumulation at this feature was seen in both Kelvin-probe transients and from unusual features in both current-voltage and capacitance-voltage measurements. The devices achieved a hysteresis-free best power conversion efficiency of 2.08%, VOC 0.46 V, JSC 11.77 mA/cm <sup xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">2</sup> , and FF 38.4%, demonstrating for the first time that it is possible to create a heterojunction PV device directly between the MAPI and n-Si. Further prospects for two-sided n-Si/MAPI heterojunctions are also discussed.

Surface photovoltage phenomena: theory, experiment, and applications

The theoretical concepts, experimental tools, and applications of surface photovoltage (SPV) techniques are reviewed in detail. The theoretical discussion is divided into two sections. The first reviews the electrical properties of semiconductor surfaces and the second discusses SPV phenomena. Next, the most common tools for SPV measurements and their relative advantages and disadvantages are reviewed. These include the Kelvin probe and the use of MIS structures, as well as other less used techniques. Recent novel high-spatial-resolution SPV measurement techniques are also presented. Applications include surface photovoltage spectroscopy (SPS) which is a very effective tool for gap state spectroscopy. An in-depth review of quantitative analyses, which permit the extraction of various important surface and bulk parameters, follows. These analyses include: carrier diffusion length; surface band bending, charge, and dipole; surface and bulk recombination rates; surface state distribution and properties; distinction between surface and bulk states; spectroscopy of thin films, heterostructures and quantum structures; and construction of band diagrams. Finally, concluding remarks are given.

Surface photovoltage measurements and Fermi level pinning: comments on “development and confirmation of the unified model for Schottky barrier formation and MOS interface states on III-V compounds”

The theoretical concepts, experimental tools, and applications of surface photovoltage (SPV) techniques are reviewed in detail. The theoretical discussion is divided into two sections. The first reviews the electrical properties of semiconductor surfaces and the second discusses SPV phenomena. Next, the most common tools for SPV measurements and their relative advantages and disadvantages are reviewed. These include the Kelvin probe and the use of MIS structures, as well as other less used techniques. Recent novel high-spatial-resolution SPV measurement techniques are also presented. Applications include surface photovoltage spectroscopy (SPS) which is a very effective tool for gap state spectroscopy. An in-depth review of quantitative analyses, which permit the extraction of various important surface and bulk parameters, follows. These analyses include: carrier diffusion length; surface band bending, charge, and dipole; surface and bulk recombination rates; surface state distribution and properties; distinction between surface and bulk states; spectroscopy of thin films, heterostructures and quantum structures; and construction of band diagrams. Finally, concluding remarks are given.