Surface Carbon Contamination Research Articles

Unveiling the oxidation stability of 2D gallium-intercalated monolayer epitaxial graphene through correlative microscopy

The oxidation- and air-stability of 2D gallium-intercalated monolayer epitaxial graphene was determined using correlative microscopy. Site-specific studies including AFM, scanning electron microscope, cross section STEM-HAADF, and EELS revealed that the oxygen signal detected by XPS and AES analyses originated from oxidized surface carbon contaminants without the presence of oxygen at the 2D gallium layers. In addition, the air-stability of the 2D gallium was correlated with the presence of intact epitaxial graphene. The absence of graphene leads to oxidation of the 2D gallium in air, consequently losing the crystallinity of the epitaxial gallium layer. This study invokes the importance of correlative microscopy to better understand defects in 2D metals that have been recently recognized through the confinement heteroepitaxy. In addition, this study highlights the advantage of using high spatial resolution STEM techniques in comparison with XPS that has relatively lower resolution.

Highly Efficient HTM-Free Tin Perovskite Solar Cells with Outstanding Stability Exceeding 10000 h.

The bottleneck in the rapid development of tin-based perovskite solar cells (TPSCs) is the inherent chemical instability. Although this is being addressed continuously, the device performance has not improved further due to the use of PEDOT:PSS as the hole-transport material (HTM), which has poor long-term stability. Herein we have applied commercial ITO nanoparticles over ITO glass substrates and altered the surface chemistry of the ITO electrode via a simple two-step thermal annealing, followed by a UV-ozone treatment. These surface-modified ITO electrodes display promising interfacial characteristics, such as a suitable band alignment owing to significantly reduced surface carbon contamination, increased In-O bonding, and reduced oxygen vacancies, that enabled fabrication of an HTM-free TPSC device according to a two-step method. The fabricated device possessed an outstanding power conversion efficiency (PCE) of 9.7%, along with a superior long-term stability by retaining over 90% of the initial PCE upon shelf storage in a glovebox for a period of over 10000 h. The application of ITO nanoparticles led to effective interfacial passivation, whose impacts on the long-term durability were assessed using electrochemical impedance spectroscopy, time-resolved photoluminescence decay profiles, and femtosecond transient absorption spectroscopy techniques.

XPS and FTIR investigations of the transient photocatalytic decomposition of surface carbon contaminants from anatase TiO2 in UHV starved water/oxygen environments

This paper explores the transient photocatalytic oxidation mechanism of carbon contaminants from a high surface area anatase TiO2 pellet under starved water/oxygen reaction conditions created when specimens are irradiated via a 375 nm UV laser inside the UHV analysis chamber of an XPS spectrometer. Complementary results are also provided following similar UV irradiations and reaction procedures in an evacuated in situ reaction cell of a Fourier-transform infrared spectrometer (FTIR). An interactive and non-steady state transient photocatalytic reaction is observed between surface carbon species and strongly adsorbed H2O brought to the exterior surface of the pellet via UV photodesorption from within the deeper lying pores of the pellet. The reaction stoichiometry and quantum efficiency of the reaction are reported at various irradiation intensities. In situ FTIR spectral features are also presented and discussed for a non-UV treated TiO2 sample and a 2-hour UV-treated TiO2 sample under evacuated conditions also showing the decomposition of carbon contaminants species and the consumption of adsorbed water/hydroxyls with the ensuing formation of carboxyl (HO-CO) carbon species and isolated surface hydroxyls. The photocatalytic decomposition of carbon species and the concomitant consumption of oxygen containing species was also tracked by following the XPS spectral changes of a UV-irradiated area on the pellet surface compared to a dark reference spot on the same specimen. Eight different reaction cases at four different UV intensities, repeated twice each, were also investigated using separate pieces of the same TiO2 media. The measured stoichiometry for the decomposition of carbon species and consumption of oxygen ranged from 0.53 during the first 10–20 min of irradiation and increased to 0.65 with an average value of 0.59 and a standard deviation of 0.11. These data suggest that the reaction product and leaving group from the TiO2 surface is primarily CO2 during the first 10–20 min of initial reaction with perhaps a small fraction of CO toward the end of reaction. Heating the sample specimen to 100 °C for 2-hour inside the XPS-UHV analysis chamber prior to UV illumination was effective in eliminating photocatalytic oxidation and carbon removal from the surface thereby demonstrating that strongly adsorbed water (prior to heating in vacuum) was a critical and limiting reagent in the overall H2O transport and reaction process.Photon efficiencies for the reaction were calculated based on the number of carbon species removed from the XPS-observable surface versus the number of the UV photons adsorbed in the topmost 2 nm of the sample. The highest photon efficiency observed was 0.0186 after 5–10 min of UV exposure at 1.5 mW/cm2. All reaction cases showed a significant efficiency drop after 30 min of UV irradiation due to the consumption of the adsorbed reactants, both carbon and water. From detailed deconvolution of the XPS C 1s spectra, UV irradiation showed a high selectivity towards hydrocarbon contaminant decomposition, which was 75% ± 5% of all carbon species removed.

Shape- and Element-Sensitive Reconstruction of Periodic Nanostructures with Grazing Incidence X-ray Fluorescence Analysis and Machine Learning.

The characterization of nanostructured surfaces with sensitivity in the sub-nm range is of high importance for the development of current and next-generation integrated electronic circuits. Modern transistor architectures for, e.g., FinFETs are realized by lithographic fabrication of complex, well-ordered nanostructures. Recently, a novel characterization technique based on X-ray fluorescence measurements in grazing incidence geometry was proposed for such applications. This technique uses the X-ray standing wave field, arising from an interference between incident and the reflected radiation, as a nanoscale sensor for the dimensional and compositional parameters of the nanostructure. The element sensitivity of the X-ray fluorescence technique allows for a reconstruction of the spatial element distribution using a finite element method. Due to a high computational time, intelligent optimization methods employing machine learning algorithms are essential for timely provision of results. Here, a sampling of the probability distributions by Bayesian optimization is not only fast, but it also provides an initial estimate of the parameter uncertainties and sensitivities. The high sensitivity of the method requires a precise knowledge of the material parameters in the modeling of the dimensional shape provided that some physical properties of the material are known or determined beforehand. The unknown optical constants were extracted from an unstructured but otherwise identical layer system by means of soft X-ray reflectometry. The spatial distribution profiles of the different elements contained in the grating structure were compared to scanning electron and atomic force microscopy and the influence of carbon surface contamination on the modeling results were discussed. This novel approach enables the element sensitive and destruction-free characterization of nanostructures made of silicon nitride and silicon oxide with sub-nm resolution.

Factors influencing surface carbon contamination in ambient-pressure x-ray photoelectron spectroscopy experiments

Carbon contamination is a notorious issue that has an enormous influence on surface science experiments, especially in near-atmospheric conditions. While it is often mentioned in publications when affecting an experiment’s results, it is more rarely analyzed in detail. We performed ambient-pressure x-ray photoelectron spectroscopy experiments toward examining the build-up of adventitious carbon species (both inorganic and hydrocarbons) on a clean and well-prepared surface using large-scale (50 × 10 mm2) rutile TiO2(110) single crystals exposed to water vapor and liquid water. Our results highlight how various factors and environmental conditions, such as beam illumination, residual gas pressure and composition, and interaction with liquid water, could play roles in the build-up of carbon on the surface. It became evident that beam-induced effects locally increase the amount of carbon in the irradiated area. Starting conditions that are independent of light irradiation determine the initial overall contamination level. Surprisingly, the rate of beam-induced carbon build-up does not vary significantly for different starting experimental conditions. The introduction of molecular oxygen in the order of 10 mbar allows for fast surface cleaning during x-ray illumination. The surface carbon contamination can be completely removed when the oxygen partial pressure is comparable to the partial pressure of water vapor in the millibar pressure range, as was tested by exposing the TiO2(110) surface to 15 mbar of water vapor and 15 mbar of molecular O2 simultaneously. Furthermore, our data support the hypothesis that the progressive removal of carbon species from the chamber walls by competitive adsorption of water molecules takes place following repeated exposure to water vapor. We believe that our findings will be useful for future studies of liquid-solid interfaces using tender x rays, where carbon contamination plays a significant role.

Photofunctionalization effect and biological ageing of PEEK, TiO2 and ZrO2 abutments material

The aim of this study was to evaluate the effectiveness of UVC photofunctionalization in removing the surface carbon contamination compounds from the most used surfaces utilized in dental implantology: TiO2, ZrO2 and PEEK. Machined samples were treated by UVC light in an Ushio Therabeam SuperOsseo® device for 12 min each. Non-treated disks were set as controls. X-Ray photoelectron spectroscopy was used to monitor the changes in surface chemical composition. Photofunctionalization of the PEEK material has been analyzed here for the first time. The removal of hydrocarbons allowed by UVC irradiation was nearly twofold, and irradiation simultaneously led to an increase of H-O-C=O bonds. For TiO2 and ZrO2 surfaces, the loss of hydrocarbons detected after UVC irradiation was threefold. The chemical stability of surfaces when left at atmospheric conditions after UVC irradiation was monitored during 10 weeks. After 6 weeks the carbon contamination on TiO2 surfaces returned to the level before UVC treatment, while for ZrO2 and PEEK it was 75% and 60% of its initial value, respectively. None of the materials tested displayed any toxicity towards human fibroblasts cultured in direct contact with them, confirming their potential employment for manufacturing of implant abutments. UVC photofunctionalization can be thus regarded as a valid method in order to reverse the detrimental effects of biological ageing of implant surfaces.

Spatially Controlled Fabrication and Mechanisms of Atomically Thin Nanowell Patterns in Bilayer WS2 Using in Situ High Temperature Electron Microscopy.

We show controlled production of atomically thin nanowells in bilayer WS2 using an in situ heating holder combined with a focused electron beam in a scanning transmission electron microscope (STEM). We systematically study the formation and evolvement mechanism involved in removing a single layer of WS2 within a bilayer region with 2 nm accuracy in location and without punching through to the other layer to create a hole. Best results are found when using a high temperature of 800 °C, because it enables thermally activated atomic migration and eliminates the interference from surface carbon contamination. We demonstrate precise control over spatial distributions with 5 nm accuracy of patterning and the width of nanowells adjustable by dose-dependent parameters. The mechanism of removing a monolayer of WS2 within a bilayer region is different than removing equivalent sections in a monolayer film due to the van der Waals interaction of the underlying remaining layer in the bilayer system that stabilizes the excess W atom stoichiometry within the edges of the nanowell structure and facilitates expansion. This study offers insights for the nanoengineering of nanowells in two-dimensional (2D) transitional metal dichalcogenides (TMDs), which could hold potential as selective traps to localize 2D reactions in molecules and ions, underpinning the broader utilization of 2D material membranes.

Structure of a Superhydrophilic Surface: Wet Chemically Prepared Rutile-TiO2(110)(1 × 1).

Surface X-ray diffraction has been employed to quantitatively determine the geometric structure of an X-ray-induced superhydrophilic rutile-TiO2(110)(1 × 1) surface. A scatterer, assumed to be oxygen, is found at a distance of 1.90 ± 0.02 Å above the five-fold-coordinated surface Ti atom, indicating surface hydroxylation. Two more oxygen atoms, situated further from the substrate, are also included to achieve the optimal agreement between experimental and simulated diffraction data. It is concluded that these latter scatterers are from water molecules, surface-localized through hydrogen bonding. Comparing this interfacial structure with previous studies suggests that the superhydophilicity of titania is most likely to be a result of the depletion of surface carbon contamination coupled to extensive surface hydroxylation.

Al2O3/Si0.7Ge0.3(001) & HfO2/Si0.7Ge0.3(001) interface trap state reduction via in-situ N2/H2 RF downstream plasma passivation

A novel method for passivating the interface between Si0.7Ge0.3 using an in-situ downstream RF plasma consisting of a nitrogen-rich mixture of H2 and N2 gases at 250 °C prior to atomic layer deposition (ALD) of Al2O3 and HfO2 was demonstrated. XPS spectra of the interface with Al2O3 indicated the presence of a nitride layer enriched in SiONx and depleted in Ge relative to the substrate. The electrical properties of this interface were characterized using I-V and variable frequency C-V measurements of MOS capacitors. The N2/H2 plasma passivation process produced a reduced density of interface trap states (Dit) and lower gate leakage compared with ex-situ HF clean and sulfur passivation for Al2O3 gate oxides. The lowered leakage current and Dit observed compared with HF(aq) or sulfur-passivated surfaces were consistent with enhanced oxide nucleation due to N2/H2 plasma passivation lowering carbon surface contamination and dangling bonds. TEM/EELS analysis of the interface was consistent with the presence of a thin interfacial nitride layer suppressing the formation of GeO bonds at the interface to form an SiOx-rich interlayer (IL).

Effect of HF/HNO3-treatment on the porous structure and cell penetrability of titanium (Ti) scaffold

Porous titanium (Ti) implants have been used in orthopedic and dental applications because of their superior mechanical properties. Sufficient pore interconnectivity is required for effective bone regeneration and growth inside the Ti scaffold pore structure. We proposed post-treatment with HF/HNO3 to efficiently modify the internal pore structure of a Ti scaffold and achieve controllable mechanical properties with a pore neck structure. The porosity, pore size, wall thickness, and pore neck size were easily controlled by varying the acid treatment time, which produced a Ti scaffold with mechanical properties that were suitable for bone tissue engineering. As the mixed acid treatment time increased, internal isolated pores were gradually interconnected with adjacent pores. After 10min of treatment, nearly all the pores were interconnected. The post-treatment with HF/HNO3 also affected the surface properties. Surface carbon contaminants were significantly reduced after treatment with no hydride formation. Micron-scale surface roughness was uniformly generated across the whole surface. The actual cell penetrability of the Ti scaffold was evaluated using a perfusion-based in vitro cell test. Over 90% of the surface pores depict cell penetrability with a sufficient number of cells attached to the wall surface of the pore after performing acid treatment for 12min.

Effect of surface carbon contamination on the chemical states of N-doped ZnO thin films

Nitrogen-doped ZnO thin films [ZnO:N] and intentional surface carbon-contaminated ZnO:N thin films [ZnO:N@C] were grown on quartz substrates by radio frequency magnetron sputtering deposition method. The structural, electrical and optical properties as well as chemical states of elements were investigated by means of X-ray diffraction (XRD), Hall effect measurement (Hall), UV–Vis–Near infrared spectrophotometer and X-ray photoelectron spectroscopy (XPS). The results indicate that surface carbon contamination almost does not affect the band gap of ZnO:N thin films but has a strong impact on the crystal quality of ZnO:N thin film surface and results in a significant increase in tensile stress. The XPS analysis shows that the effect of surface carbon contamination treatment on the chemical states of ZnO:N thin films is remarkable. Because the stability of Zn–N bonds in N-rich local environments is nowhere near that of those in O-rich local environments, the N atoms in N-rich local environments easily bond with surface carbon atoms to form undesirable C–N bonds, thus resulting in a decrease of NO acceptors in N-rich local environments. Obviously, it is unfavorable to subsequently prepare high stability of N-doped p-type ZnO thin films.

Lead-silicate glass surface sputtered by an argon cluster ion beam investigated by XPS

The conventional ion beam sputter-cleaning technique is frequently used for removing surface adsorbates and carbon contamination from air-exposed glass surfaces. Due to the ion-surface interaction, however, an altered near-surface layer is formed with a modified composition and modified bonding. In the present work, we first examine changes in surface composition and bonding due to X-ray and electron irradiation for both air-exposed and sputter-cleaned surfaces. Then we apply argon cluster ion beam sputtering, known as a very gentle technique with respect to the changes in surface chemistry, to air-exposed lead-silicate glass surfaces analyzed by high-energy resolved core-level photoelectron spectroscopy. It was found that (i) the surface contamination present on air-exposed lead-silicate glass surfaces has a qualitative influence on the results of an XPS analysis, and (ii) Ar cluster ion beam sputter-cleaning with mean energy per Ar atom in clusters of a few eV was successfully used to remove surface contamination from air-exposed lead-silicate glass with no substantial violation of the glass surface structure. This made it easier to reveal their intrinsic surface properties.

Peak position differences observed during XPS sputter depth profiling of the SEI on lithiated and delithiated carbon-based anode material for Li-ion batteries

The ability of delivering chemical information from peak shift phenomena has ever since made X-ray photoelectron spectroscopy (XPS) an ideal tool for material characterization in Li-ion batteries (LIB). Upon investigation, charging is inevitable as most of the chemical species involved are non-conducting. Thus, the binding energy (BE) scale must be corrected to allow an accurate interpretation of the results. This is usually done using the peak position of the ubiquitous surface carbon contamination detectable for all Li-ion battery relevant materials. We herein report on the occurrence of peak shift phenomena that can be observed when investigating surface layers on graphite anodes using sputter depth-profiling. These shifts, however, are not related to classical static electric charging, but are depending on the state of charge (lithiation) of the anode material. The observations presented are in agreement with previous findings on other Li-containing materials and are obviously caused by the presence of Li in its elemental state. As aging and failure mechanisms in LIBs are closely linked to electrolyte reaction products on electrode surfaces it is of high importance to draw the correct conclusions on their chemical origin from XP spectra. In order to avoid misinterpretation of the BE positions, implanted Ar can be used for identification of relevant peak positions and species involved in the phenomena observed.

Surface chemistry and initial growth of Al2O3 on plasma modified PTFE studied by ALD

This paper reports on the growth of ultra-thin Al2O3 layers deposited on polytetrafluoroethylene (PTFE) surfaces pre-treated by atmospheric pressure ambient air plasma. Al2O3 thin films were deposited by a thermal atomic layer deposition (ALD) process using trimethylaluminium and water at 100°C. The concentration of elements and the bonding structures in layers resulting from up to 350 ALD cycles was measured by X-ray photoelectron spectroscopy. It was disclosed that the concentration of oxygen-containing groups increased initially as surface carbon contamination was oxidised, then decreased as the surface composition approached pure PTFE. In general, the plasma-treated samples showed significantly faster nucleation; 300 cycles were necessary for the formation of a complete film on untreated PTFE, whereas only 150 cycles were needed to create uniform films on plasma-pre-treated PTFE surfaces. The swiftest nucleation behaviour was associated with the highest number of oxygen-containing groups on the surface rather than complete removal of contamination. As demonstrated here, the state of a plasma-activated surface may easily be studied by means of deposition of atomic layers by the ALD method.

The effects of surface conditions of TiO2 thin film on the UV assisted sensing response at room temperature

ABSTRACT Thin film oxides have attracted attention in implementations of gas sensors, notably NO 2 , owing to their unique physical, optical, and chemical properties. While the properties are presumed to be strongly dependent on the surface conditions of the thin films, it is not yet clear how surface properties of the thin film gas sensor affect its analyte sensing response. Here, we report the influence of surface carbon contamination and roughness on the NO 2 sensing properties of TiO 2 thin film sensors. The TiO 2 thin films were prepared by rf-sputtering. The surface of the films were intentionally contaminated and damaged with organic polymers (photolithography resist) and microwave plasma, respectively. The surface chemistry of the films was assessed by high resolution X-ray photoelectron spectroscopy, and atomic force microscopy was exploited to obtain the morphology of the fabricated sensors. The work aims to improve the long-term efficacy of gas sensors by studying the reasons for degradation in performance. Our results indicate that the carbon residue and surface roughness of the TiO 2 based sensor prolong the NO 2 response time by roughly threefold and fivefold, respectively. The recovery rate of the sensor is deteriorated by the poor surface conditions as well.

Titanium surface properties indirectly regulate osteoclasts via osteoblast lineage cells

Titanium surface properties indirectly regulate osteoclasts via osteoblast lineage cells

Surface Cleaning of SiGe(100) and Passivation of Ge(100) with Aqeuous Ammonium Sulfide

As scaling of microelectronic devices continues, germanium and silicon-germanium are promising materials for integration into silicon-based technology. Germanium and silicon-germanium based field-effect transistors can reduce leakage current and consume less power by means of improved carrier mobility and a narrower band gap, as opposed to traditional electronics. However, silicon-germanium surfaces are more challenging to work with because the topmost surface layer is comprised of germanium oxides that complicate cleaning and passivation processes. Here we seek to obtain a smooth, oxide free SiGe surface and hope to garner an understanding of the best conditions to effectively remove surface oxides. Additionally, we hope to further our understanding of aqueous ammonium sulfide passivation processes on Ge surfaces that will prevent re-oxidation of the surface for applications towards modern field-effect transistors (FETs). The first portion of this work focuses on the removal of oxides from the SiGe surface with 50 and 75% Ge molar ratios using a variety of aqueous processes. These processes include SC-1, HCl, HF, and HCl/HF mixtures. The SiGe surface was characterized using X-ray photoelectron Spectroscopy (XPS) after each chemical treatment. Film thicknesses were measured using spectroscopic ellipsometry. Immersion in HCl showed similar results to as shipped samples and was ineffective in removing surface oxides. Aqueous HF, however, removed both surface oxides and carbon contamination. SC-1 treatments selectively reduced the Ge in the SiGe film and left the surface enriched in Si, which oxidized as confirmed by XPS. If the Ge could be completely removed from the top-most layer, the SiO2 layer that forms could be used to passivate the SiGe surface and avoid problematic Ge oxides. Ellipsometry results showed that SC-1 solutions (NH4OH:H2O2:H2O, 1:1:100 v/v) etched 1 nm of the SiGe film, which was then oxidized. Ge 2p to Si 2p XPS peak ratios confirmed that increasing concentrations of SC-1 depleted the Ge content on the surface from 0.8 to 0.4, confirming the enrichment of the surface in Si. Ge to Si peak area ratios as a function of the SC-1 dilution factor showed a non-linear trend for SiGe 50% surfaces. Passivation of Ge with aqueous (NH4)2S was also studied. Because Ge oxides are unstable and water soluble, it is advantageous to remove them and deposit a sulfur layer to prevent further oxidation when exposed to air. Surface passivation was studied as a function of deposition time, solution concentration and the addition of H2O2. Passivation of the surface was ineffective at times below 20 min. Changing the concentration of (NH4)2S also had no noticeable effect on the surface based on XPS. Furthermore, at high ammonium sulfide concentrations the addition of H2O2 did not affect the passivation process. The addition of H2O2 to dilute (NH4)2S showed poor passivation due to oxidation of the surface by H2O2.

Surface evolution of lanthanum strontium cobalt ferrite thin films at low temperatures

The ultra-high vacuum surface preparation of heteroepitaxial lanthanum strontium cobalt ferrite thin films has been studied using soft X-ray photoelectron spectroscopy. Specifically, the effect of annealing the films at low temperatures in low partial pressures of oxygen and argon has been investigated. We find that atmospheric surface carbon contamination of the films can be removed in select anneal temperature regimes in argon, but remains bound to the surface with oxygen annealing at any temperature.Irrespective of the gas used, an insulating phase transition occurs near 300°C due to strontium segregation at the surface. The surface develops more insulating character if annealed with oxygen. Different species are proposed to be responsible for the discrepancy in insulating character.

Dependence of LTX plasma performance on surface conditions as determined by in situ analysis of plasma facing components

The Materials Analysis and Particle Probe (MAPP) diagnostic has been implemented on the Lithium Tokamak Experiment (LTX) at PPPL, providing the first in situ X-ray photoelectron spectroscopy (XPS) surface characterization of tokamak plasma facing components (PFCs). MAPP samples were exposed to argon glow discharge conditioning (GDC), lithium evaporations, and hydrogen tokamak discharges inside LTX. Samples were analyzed with XPS, and alterations to surface conditions were correlated against observed LTX plasma performance changes. Argon GDC caused the accumulation of nm-scale metal oxide layers on the PFC surface, which appeared to bury surface carbon and oxygen contamination and thus improve plasma performance. Lithium evaporation led to the rapid formation of a lithium oxide (Li2O) surface; plasma performance was strongly improved for sufficiently thick evaporative coatings. Results indicate that a 5h argon GDC or a 50nm evaporative lithium coating will both significantly improve LTX plasma performance.

Spectrum imaging of complex nanostructures using DualEELS: I. Digital extraction replicas.

This paper shows how it is possible to use Dual Electron Energy Loss Spectroscopy (DualEELS) to digitally extract spectrum images for one phase of interest in a complex nanostructured specimen. The specific cases studied here concern Nb or V precipitates, a few nanometres in size, in high manganese steels. The procedures outlined allow the extraction of the precipitate signal from the Fe-Mn matrix, as well as correction for surface oxide and any surface carbon contamination. The resulting precipitate-only spectrum images are then suitable for quantitative analysis of the precipitate chemistry. This procedure results in much improved background shapes under all edges of interest, mainly as a result of the removal of the extended electron loss fine structure (EXELFS) from the elements in the matrix. This allows the reliable extraction of even tiny quantities of elements, such as low levels of nitrogen in some carbide precipitates. As well as being relevant to precipitation in steels, these techniques will be widely applicable to the separation of chemically-distinct phases in complex nanostructured samples, and can be viewed as a digital version of the extraction replica technique.