We designed novel acrylate monomers with an alicyclic lactone group [3-oxa-4-oxotricyclo[5.3.1.06,10]undecanyl (OTCU) or 4,4-dimethyl-5-oxa-6-oxo tetracyclo[7.2.1.02,8.03,7]dodecyl (OTCD) group] for an ArF chemically amplified resist. The polymers with these monomer units exhibited high transparency at 193 nm and good adhesion to a Si substrate. They were also extremely durable against dry etching. The etching durability of polymer with the OTCD group was superior to that of the polymer with the OTCU group. Furthermore, a chemically amplified positive resist comprised of terpolymer with an OTCD units and a photo-acid generator achieved a resolution of 130-nm L/S with an ArF exposure system.