2D Transition Metal Dichalcogenides Research Articles

Two-Dimensional ZrS2 and HfS2 for Making Sub-10 nm High-Performance P-Type Transistors.

Two-dimensional (2D) transition metal dichalcogenide (TMDC) semiconductors have been recognized as reliable candidates for future sub-10 nm physical gate length field-effect transistors (FETs). However, the device performance of 2D P-type devices is far inferior to that of N-type devices, which seriously hinders the development of complementary metal-oxide-semiconductor (CMOS) integrated circuits. Herein, we presented that two new 2D TMDC channel materials, ZrS2 and HfS2, can realize high-performance P-type MOSFETs through first-principles quantum transport simulations. Different from the 2D MoS2 and WSe2, the continuous in-plane p-orbitals at the valence band edge of 2D ZrS2 and HfS2 lead to a small hole effective mass of 0.24 m0. As a result, 2D ZrS2 and HfS2 P-type MOSFETs with 10 nm gate length possess an on-state current (Ion) as high as 2000 μA/μm. Moreover, even when the gate length shrinks to 5 nm, the Ion can also reach ∼1500 μA/μm with the energy delay product ranging from 3 × 10-30 to 1 × 10-29 Js/μm, which are better than many other 2D P-type MOSFETs like MoS2 and WSe2. Our work demonstrates that 2D ZrS2 and HfS2 are competitive channel materials for constructing future sub-10 nm P-type high-performance FETs.

Scalable fabrication of vertically arranged Bi2Se3 crossbar arrays for memristive device applications

Despite the unique advantages of the memristive switching devices based on two-dimensional (2D) transition metal dichalcogenides, scalable growth technologies of such 2D materials and wafer-level fabrication remain challenging. In this work, we present the gold-assisted large-area physical vapor deposition (PVD) growth of Bi2Se3 features for the scalable fabrication of 2D-material-based crossbar arrays of memristor devices. This work indicates that gold layers, prepatterned by photolithography processes, can catalyze PVD growth of few-layer Bi2Se3 with 100-folds larger crystal grain size in comparison with that grown on bare Si/SiO2 substrates. We also present a fluid-guided growth strategy to improve growth selectivity of Bi2Se3 on Au layers. Through the experimental and computational analyses, we identify two key processing parameters, i.e., the distance between Bi2Se3 powder and the target substrate and the distance between the leading edges of the substrate and the substrate holder with a hollow interior, which plays a critical role in realizing large-scale growth. By optimizing these growth parameters, we have successfully demonstrated cm-scale highly-selective Bi2Se3 growth on crossbar-arrayed structures with an in-lab yield of 86%. The whole process is etch- and plasma-free, substantially minimizing the damage to the crystal structure and also preventing the formation of rough 2D-material surfaces. Furthermore, we also preliminarily demonstrated memristive devices, which exhibit reproducible resistance switching characteristics (over 50 cycles) and a retention time of up to 106 s. This work provides a useful guideline for the scalable fabrication of vertically arranged crossbar arrays of 2D-material-based memristive devices, which is critical to the implementation of such devices for practical neuromorphic applications.

2D‐MoX2 (X = S, Se, Te) and Their Nanocomposite Toward Sensing Application: A Review

Abstract2D materials, owing to their nearly atomic thickness, have emerged as promising candidates across a broad spectrum of next‐generation devices and systems. In the post‐graphene era, molybdenum‐based dichalcogenides (MoX2, where X = S, Se, Te), possessing a graphene‐like structure, represent one of the most promising subsets among 2D transition metal dichalcogenides (TMDs) due to their extensively researched and distinctive electronic, optical, and mechanical properties. Further with their distinct properties of different phases (2H, 1T) make it attractive for both fundamental and applied research. It finds diverse applications, spanning from optoelectronics to catalysis and sensor development. In this review article, the unique crystal structural properties of MoX2 are highlighted and their different synthesis methods, incorporating recent advancements in synthesis approaches discussed. Subsequently the recent development of MoX2 nanocomposite based on carbon, metal, metal oxide and various polymer discussed. Finally, the key challenges impeding the advancement of sensing applications and propose avenues for future development, drawing upon the current progress in 2D MoX2 and their nanocomposites also find mention in this review.

Multiple Conformal-Contact Transfer of Large-Area Crack-Free Transition Metal Dichalcogenide Stacks

Abstract Atomically-thin two-dimensional (2D) transition metal dichalcogenides (TMDs) have emerged as an ideal platform for both physics investigation and device applications. By stacking different layers into homo- or hetero-structures, an extra degree of freedom is involved in further tuning their properties, thereby boosting scenarios in twistronics, moiré photonics and optoelectronics. However, interfacial imperfections such as contaminations and cracks, frequently occur during the layer stacking sequence and accumulate layer by layer, greatly degenerating the interface quality. In this study, we developed a multiple conformal-contact transfer method to construct TMD stacks with crack-free intrinsic interfaces. The design of a deformable buffer layer is crucial to guarantee the conformal contact and intact transfer of each layer, contributing to the successful construction of centimetre-scale TMD stacks up to 8 layers. Precise control over spatial location and interlayer twist angle is also feasibly achieved, evidenced by the stacking-dependent interlayer exciton effects in WS2-WSe2 heterostructures. This work provides a facile and precise approach for architecting 2D stacks with perfect interfaces, which will further accelerate the customized design for their device functionalization.

Layer Number and Stacking Engineering of MoS2 Crystals for High-Performance Polarization-Sensitive Photodetector.

The layer and stacking engineering of two-dimensional (2D) transition-metal dichalcogenides (TMDs) gives rise to novel phenomena and multiapplications; thus, TMDs have garnered considerable attention. However, the precisely customized fabrication of stacked 2D materials to date is largely limited to the lack of effective and controllable growth strategies, prone to the unpredictable stacking orders and randomly distributed nucleation sites. Here, we devise an optimized chemical vapor deposition approach for modulating the MoS2 single crystals from monolayer to multilayer with diverse stacking configurations. Significantly, the phototransistor based on monolayer MoS2 single crystal exhibits an ultrasensitive performance with a high photoresponsivity (R) of 3.3 × 104 A W-1 and a remarkable detectivity (D*) of above 1.7 × 1014 Jones at 405 nm light illumination. Ultralow-frequency and angle-resolved polarized Raman spectroscopy is used to systematically uncover the delicate interlayer interactions and crystallographic anisotropy. Moreover, the polarization-sensitive photodetectors using 1-3L MoS2 show a layer number-dependent anisotropic performance, with dichroism ratios of 1.36, 1.44, and 1.52. This work offers a promising method to not only enable the fabrication of new customized layer-, stacking-, and twist-2D materials but also provides the foundation for the development of advanced polarization-sensitive and optoelectronic devices based on stacking transitions.

Quasi-Zero-Dimensional Source/Drain Contact for Fermi-Level Unpinning in a Tungsten Diselenide (WSe2) Transistor: Approaching Schottky-Mott Limit.

Two-dimensional (2D) transition metal dichalcogenides (TMDCs) known for their exceptional electrical and optical properties have emerged as promising channel materials for next-generation electronics. However, as strong Fermi-level pinning (FLP) between the metal and the 2D TMDC material at the source/drain (S/D) contact decides the Schottky barrier height (SBH), the transistor polarity is fixed to a certain type, which remains a challenge for the 2D TMDC field-effect transistors (FETs). Here, a S/D contact structure with a quasi-zero-dimensional (quasi-0D) contact interface, in which the dimensionality reduction effect alleviates FLP, was developed to gain controllability over the polarity of the 2D TMDC FET. As a result, conventional metal contacts on the WSe2 FET showed n-type characteristics due to strong FLP (pinning factor of 0.06) near the conduction band, and the proposed quasi-0D contact enabled by the Ag conductive filament on the WSe2 FET exhibited p-type characteristics with a SBH very close to the Schottky-Mott rule (pinning factor of 0.95). Furthermore, modeling of Schottky barriers of conventional contacts, one-dimensional (1D) contacts, and quasi-0D contacts revealed that the SBH of the quasi-0D contact is relatively less subject to interface dipoles that induce FLP, owing to more rapid decaying of dipole energy. The proposed contact in this study provided a method that progressed beyond the alleviation of FLP to achieve controllable polarity. Moreover, reducing the contact dimensionality to quasi-0D will enable high compatibility with the further scaled-down nanoscale device contact structure.

Comparative analysis of thermoelectric properties in bulk 2H and monolayer MoS2: a first-principles study at high temperatures

The pursuit of high-efficiency heat-to-electricity conversion is one of the indispensable driving forces toward future renewable energy production. The two-dimensional (2D) transition metal dichalcogenide, such as molybdenum disulfide (MoS2), is at the forefront of research due to its outstanding heat propagation features and potential applications as a thermoelectric material. Using the first-principles density functional theory coupled with the semi-classical Boltzmann transport equation within the constant relaxation time approximation, we present the thermoelectric and energy transport in the bulk 2H and monolayer MoS2 material system. In order to advance the underlying physics, we calculate several crucial transport parameters such as electrical conductivity, electronic thermal conductivity, Seebeck coefficient, and power factor as a function of the reduced chemical potential for different doping types and temperatures, in addition to the electron energy dispersion relation of the material system. Our comprehensive study employs the Shankland interpolation algorithm and the rigid band approximation to attain a high degree of accuracy. This thorough investigation reveals the high Seebeck coefficient of 1534 and 1550 μ V/K at 500 K for the bulk 2H and monolayer MoS2, respectively. Furthermore, the ultrahigh power factor values of 9.21 × 1011 and 3.69 × 1011 Wm −1 K −2 s −1 are shown at 800 K in the bulk 2H and monolayer MoS2, respectively. Based on the power factor results, our in-depth analysis demonstrates that the bulk 2H MoS2, when compared to monolayer MoS2, exhibits great potential as a promising semiconducting thermoelectric material for advanced high-performance energy device applications.

Understanding Iron-Doping Modulating Domain Orientation and Improving the Device Performance of Monolayer Molybdenum Disulfide.

Domain orientation modulation and controlled doping of two-dimensional (2D) transition-metal dichalcogenides (TMDCs) are two pivotal tasks for synthesizing wafer-scale single crystals and boosting device performances. However, realizing two such targets and uncovering internal physical mechanisms remain daunting challenges. We develop an accurate Fe doping strategy, which enables domain orientation control and electron mobility improvement of monolayer MoS2. By tuning of the Fe dopant dosages, parallel steps with different heights are formed, which induce edge-nucleation of unidirectionally aligned monolayer MoS2. In parallel, Fe doping induces the down shift of the conduction band minimum of monolayer MoS2 and matches well with the work function of an electrode, which reduces Schottky barrier height and delivers ultralow contact resistance (561 Ω μm) and excellent electron mobility (37.5 cm2 V-1 s-1). The modulation mechanism is clarified by combining theory calculations and electronic structure characterizations. This work hereby provides a new paradigm for synthesizing wafer-scale 2D TMDC single crystals and constructing high-performance devices.

Easy Direct Functionalization of 2D MoS2 Applied in Covalent Hybrids with PANI as Dual Blend Supercapacitive Materials

AbstractThe pressing demand for more sustainable energy provision and the ongoing transition toward renewable resources underline the critical need for effective energy storage solutions. To address this challenge, scientists persistently explore new compounds and hybrids and, in such a dynamic research field, 2D materials, particularly transition metal di‐chalcogenides (TMDCs), show great potential for electrochemical energy storage uses. Simultaneously, also conductive polymers (CPs) are interesting and versatile supercapacitor materials, especially polyaniline (PANI), which is extensively studied for this purpose. In this work, a powerful method to combine TMDCs and PANI into covalently grafted hybrids starting from aniline functionalized few‐layers 1T‐MoS2, attained by a facile direct arylation with iodoaniline, is presented. The hybrids provide circa 70 F g−1 specific capacitance in a pseudo device setup, coupled with a robust capacitance retention of well over 80% for up to 5000 cycles. These findings demonstrate the potential of similar covalent composites to work as active components for novel, innovative energy storage technologies. At the same time, the successful synthesis marks the efficacy of direct covalent grafting of conductive polymer on the surface of 2D TMDCs for stable functional materials.

Highly efficient 2D transition metal Dichalcogenides/SnSe solar cells using Sb2S3 as a back surface field and interfacial layer engineering

Boosting the performance of solar cells is crucial for advancing photovoltaic technology. This study investigates the integration of alternative 2D materials to enhance the performance of solar cells. Three solar cell configurations sample 1 with CdS, sample 2 with MoS2, and sample 3 with SnS2 are systematically investigated via numerical simulation. The simulation framework is validated against experimental data, demonstrating good agreement. Alternative 2D materials are explored to replace toxic CdS and improve the Voc through suitable band alignment with the absorber material, SnSe. Additionally, Sb2S3 is introduced as a back surface field (BSF) for the first time, resulting in increased efficiencies across all three samples. Further performance enhancements involve the insertion of 2D interfacial layers between the electron transport layer (ETL) and absorber to mitigate interface defects. Thirteen materials are evaluated as interfacial layers and nine metals as back contacts, revealing Ni as the optimal back contact for all samples, while MoS2, SnS2, and WS2 are identified as suitable interfacial layers for samples 1, 2, and 3, respectively. Analysis of the solar cells reveals that sample 2, incorporating MoS2 and SnS2, achieves the highest efficiency at 13.58 %. This outperforms sample 3 at 13.55 % and sample 1 at 13.13 %. Sample 2′s superior performance is attributed to the effective utilization of 2D transition metal dichalcogenide (TMDC) materials, which enhance charge carrier transport and minimize recombination losses within the cell structure. Optimized solar cell configurations are modeled using a one-diode approach to build corresponding modules. These modules, created by connecting solar cells in series and parallel, are evaluated through simulated I-V characteristics and power output under standard test conditions. Analysis reveals that Module 2 exhibits superior performance, with higher short-circuit current (ISC) and open-circuit voltage (VOC) compared to Modules 1 and 3. Overall, this study demonstrates the significant role of 2D TMC materials in advancing solar cell performance, providing valuable insights for future solar energy applications.

Low-Symmetry Van der Waals Dielectric GaInS3 Triggered 2D MoS2 Giant Anisotropy via Symmetry Engineering.

Low-symmetry structures in van der Waals materials have facilitated the advancement of anisotropic electronic and optoelectronic devices. However, the intrinsic low symmetry structure exhibits a small adjustable anisotropy ratio (1-10), which hinders its further assembly and processing into high-performance devices. Here, a novel 2D anisotropic dielectric, GaInS3 (GIS), which induces isotropic MoS2 to exhibit significant anisotropic optical and electrical responses is demonstrated. With the excellent gate modulation ability of 2D GIS (dielectric constant k ∼12), MoS2 field effect transistor (FET) shows an adjustable conductance ratio from isotropic to anisotropic under dual-gate modulation, up to 106. Theoretical calculations indicate that anisotropy originates from lattice mismatch-induced charge density deformation at the interface. Moreover, the MoS2/GIS photodetector demonstrates high responsivity (≈4750 A W-1) and a large dichroic ratio (≈167). The anisotropic van der Waals dielectric GIS paves the way for the development of 2D transition metal dichalcogenides (TMDCs) in the fields of anisotropic photonics, electronics, and optoelectronics.

Atomic Nb-doping of WS2 for high-performance synaptic transistors in neuromorphic computing

Owing to the controllable growth and large-area synthesis for high-density integration, interest in employing atomically thin two-dimensional (2D) transition-metal dichalcogenides (TMDCs) for synaptic transistors is increasing. In particular, substitutional doping of 2D materials allows flexible modulation of material physical properties, facilitating precise control in defect engineering for eventual synaptic plasticity. In this study, to increase the switch ratio of synaptic transistors, we selectively performed experiments on WS2 and introduced niobium (Nb) atoms to serve as the channel material. The Nb atoms were substitutionally doped at the W sites, forming a uniform distribution across the entire flakes. The synaptic transistor devices exhibited an improved switch ratio of 103, 100 times larger than that of devices prepared with undoped WS2. The Nb atoms in WS2 play crucial roles in trapping and detrapping electrons. The modulation of channel conductivity achieved through the gate effectively simulates synaptic potentiation, inhibition, and repetitive learning processes. The Nb-WS2 synaptic transistor achieves 92.30% recognition accuracy on the Modified National Institute of Standards and Technology (MNIST) handwritten digit dataset after 125 training iterations. This study’s contribution extends to a pragmatic and accessible atomic doping methodology, elucidating the strategies underlying doping techniques for channel materials in synaptic transistors.

Advances and Applications of Oxidized van der Waals Transition Metal Dichalcogenides

AbstractThe surface oxidation of 2D transition metal dichalcogenides (TMDs) has recently gained tremendous technological and fundamental interest owing to the multi‐functional properties that the surface oxidized layer opens up. In particular, when integrated into other 2D materials in the form of van der Waals heterostructures, oxidized TMDs enable designer properties, including novel electronic states, engineered light‐matter interactions, and exceptional‐point singularities, among many others. Here, the evolving landscapes of the state‐of‐the‐art surface engineering technologies that enable controlled oxidation of TMDs down to the monolayer‐by‐monolayer limit are reviewed. Next, the use of oxidized TMDs in van der Waals heterostructures for different electronic and photonic device platforms, materials growth processes, engineering concepts, and synthesizing new condensed matter phenomena is discussed. Finally, challenges and outlook for future impact of oxidized TMDs in driving rapid advancements across various application fronts is discussed.

Optimizing dose parameters for enhanced maskless lithography in MoS2-based devices

Maskless lithography simplifies the fabrication process and reduces costs compared to electron beam (E-beam) lithography, making it a more efficient choice for patterning nano-devices. Maskless lithography presents a promising avenue for expediting device fabrication by eliminating the need for masks. This technique can streamline the production of basic electronic devices, offering an efficient and low-cost alternative to traditional lithographic methods, like E-beam lithography. This study utilized a 405 nm photodiode to achieve pattern-writing with a minimum linewidth of 1 μm. Exploring optimal parameters includes adjustments in beam intensity, scan speed, and step size. Maskless lithography was applied to 2D transition metal dichalcogenides (TMDCs) material, MoS2, to investigate their electrical transport characteristics. The fabricated device exhibits an ON/OFF ratio of ∼1.7 × 106 and a mobility of ∼0.833 cm2/V·s, indicating a high switching efficiency. The results demonstrate optimized maskless lithography's potential for swift and cost-effective fabrication, offering intermediate-resolution patterning capabilities.

Atomic Basal Defect-Rich MoS2 by One-Step Synthesis and Mechanism Exploration.

Two-dimensional molybdenum disulfide (2D MoS2) shows great promise as a surface-enhanced Raman scattering (SERS) substrate due to its strong exciton resonance. However, the inert basal plane limits the performance of SERS. In this work, a strategy is proposed for the one-step synthesis of atomically basal defect-rich MoS2. The study first reveals that NaCl plays a two-stage role in the growth process, where NaCl initially promotes the rapid growth of large MoS2 as previously reported, and then promotes the formation of atomic basal defects dominated by single sulfur vacancies. Additionally, spectral changes induced by modulation of experimental parameters and density function theory calculation show that defect generation occurs during cooling. Meanwhile, the ratio of to A1g in defect-rich MoS2 exhibits different variation trends compared with pristine MoS2 in power-dependent Raman, and the ratio increases with increasing basal defects. In SERS tests, the limit of detection for rhodamine 6G reached 10-9m, which is comparable to the performance of conventional noble metal SERS substrate. The activation strategy of the inert basal plane is applicable to other 2D transition metal dichalcogenides, and further has the potential to enhance performance in other domains, such as SERS and hydrogen evolution reactions.

High-Performance p-Type Quasi-Ohmic of WSe2 Transistors Using Vanadium-Doped WSe2 as Intermediate Layer Contact.

Two-dimensional (2D) transition-metal dichalcogenides (TMDCs), such as tungsten diselenide (WSe2), hold immense potential for applications in electronic and optoelectronic devices. However, a significant Schottky barrier height (SBH) at the metal-semiconductor (MS) interface reduces the electronic device performance. Here, we present a unique 2D/2D contact method for minimizing contact resistance and reducing the SBH. This approach utilizes vanadium-doped WSe2 (V-WSe2) as the drain and source contacts. The fabricated transistor exhibited a stable operation with p-type quasi-ohmic contact and a high on/off current ratio surpassing 108 at room temperature, reaching 1011 at 10 K. The device achieved an on-current of 68.87 μA, a high mobility of 103.80 cm2 V-1 s-1, a low contact resistance of 0.92 kΩ, and remarkably low SBH values of 1.51 meV for holes at VGS = -120 V with fixed VDS = 1 V. Furthermore, a Schottky photodiode has been fabricated, utilizing V-WSe2 and Cr as the asymmetric contact platform, showing a responsivity of 116 mA W1-. The findings of this study suggest a simple and efficient method for improving the performance of TMDC-based transistors.

Performance of Low-Dimensional Solid Room-Temperature Photodetectors-Critical View.

In the last twenty years, nanofabrication progress has allowed for the emergence of a new photodetector family, generally called low-dimensional solids (LDSs), among which the most important are two-dimensional (2D) materials, perovskites, and nanowires/quantum dots. They operate in a wide wavelength range from ultraviolet to far-infrared. Current research indicates remarkable advances in increasing the performance of this new generation of photodetectors. The published performance at room temperature is even better than reported for typical photodetectors. Several articles demonstrate detectivity outperforming physical boundaries driven by background radiation and signal fluctuations. This study attempts to explain these peculiarities. In order to achieve this goal, we first clarify the fundamental differences in the photoelectric effects of the new generation of photodetectors compared to the standard designs dominating the commercial market. Photodetectors made of 2D transition metal dichalcogenides (TMDs), quantum dots, topological insulators, and perovskites are mainly considered. Their performance is compared with the fundamental limits estimated by the signal fluctuation limit (in the ultraviolet region) and the background radiation limit (in the infrared region). In the latter case, Law 19 dedicated to HgCdTe photodiodes is used as a standard reference benchmark. The causes for the performance overestimate of the different types of LDS detectors are also explained. Finally, an attempt is made to determine their place in the global market in the long term.

Toward direct band gaps in typical 2D transition-metal dichalcogenides junctions via real and energy spaces tuning

Most of the van der Waals homo- and hetero-junctions of group VIB two-dimensional (2D) transition-metal dichalcogenides (TMDs; MoS2, WS2, MoSe2, and WSe2) show indirect energy band gaps which hinders some of their applications especially in optoelectronics. In the current work, we demonstrate that most of the bilayers and even few-layers consisting of group VIB TMDs can have direct gaps by efficient weakening of their interlayer interactions via real and/or energy spaces tuning, which is based on insights from quantitative analyses of interlayer electronic hybridizations. Real space tuning here means introducing large-angle rotational misalignment between layers, which has been realized in a very recent experiment; and, energy space tuning means introducing energy mismatch between layers which can be introduced efficiently by different means thanks to the small vertical dielectric constant of 2D semiconducting TMDs. The efficient tuning in both real and energy spaces proposed here paves an avenue for indirect-direct gap regulation of homo- and hetero-junctions of TMDs and other 2D semiconductors. Notably, both tuning can be permanently preserved and hence our work is of great significance for the diverse applications of 2D semiconductors.

Enhancing reliability in oxide-based memristors using two-dimensional transition metal dichalcogenides

Oxide-based memristor is an attractive candidate for future nonvolatile resistive random access memory (RRAM) devices. However, it suffers from insufficient reliability, owing to the randomness of the conductive filaments, hindering the practical use of the memristor for future RRAM applications. Here, we propose harnessing the two-dimensional (2D) transition metal dichalcogenides (TMDs) on oxide memristor to achieve high device reliability by controlling oxygen vacancy-based filaments near the TMDs/oxide interface. By forming the Pt/WSe2/HfxZr1-xO2 (HZO)/TiN structure, the fabricated memristor exhibits high reliability with good cyclic endurance (over 2,000 cycles), retention (104 s), and low cycle-to-cycle variability. Surface chemical analysis reveals the abundant oxygen vacancies induced by forming WSe2/HZO interface are the source of filamentary switching. By incorporating 2D materials and oxides, the practical application of memristor to future information processing devices can be boosted by the enhanced device reliability.

Compositionally Graded MoS2xTe2(1-x)/MoS2 van der Waals Heterostructures for Ultrathin Photovoltaic Applications.

van der Waals heterojunctions utilizing two-dimensional (2D) transition-metal dichalcogenide (TMD) materials have emerged as focal points in the field of optoelectronic devices, encompassing applications in light-emitting devices, photodetectors, solar cells, and beyond. In this study, we transferred few-atomic-layer films of compositionally graded ternary MoS2xTe2(1-x) alloys onto metal-organic chemical vapor deposition-grown molybdenum disulfide (MoS2) as p- and n-type structures, leading to the creation of a van der Waals vertical heterostructure. The characteristics of the fabricated MoS2xTe2(1-x)/MoS2 vertical-stacked heterojunction were investigated considering the influence of tellurium (Te) incorporation. The systematic variation of parameter x (i.e., 0.8, 0.6, 0.5, 0.3, and 0) allowed for an exploration of the impact of Te incorporation on the photovoltaic performance of these heterojunctions. As a result, the power conversion efficiency was enhanced by approximately 6 orders of magnitude with increasing Te concentration; notably, photoresponsivities as high as ∼6.4 A/W were achieved. These findings emphasize the potential for enhancing ultrathin solar energy conversion in heterojunctions based on 2D TMDs.