Sort by
CURRENT–VOLTAGE MEASUREMENTS WITHIN THE NEGATIVE DIFFERENTIAL RESISTANCE REGION OF <font>AlGaAs/AlGaAs</font> TUNNEL JUNCTIONS FOR HIGH CONCENTRATION PHOTOVOLTAICS

The current–voltage characteristics of AlGaAs/AlGaAs tunnel junctions for use in multi-junction solar cells are studied experimentally, where tunneling current peaks of 1100 A/cm2 and specific contact resistivities of 0.3 × 10-4Ω⋅cm2 at 7 A/cm2 (typical concentrated photovoltaic operating current) are measured. This represents an ideal tunnel junction design, with a very low resistance and one of the highest tunneling peak currents reported for solar cells. Normally, solar cell current–voltage characteristics are measured using time-averaged methods, which, in this study, reveal a tunneling peak current density of ~950 A/cm2. Due to nonlinear oscillations within the measurement circuit, the precise locations and magnitudes of the tunneling peak and valley current densities are obscured when using time-average measurement methods. Here we present an alternative method to determine the tunneling peak current density, in which the nonlinear oscillations in the current and voltage are recorded over time and a current density–voltage curve is reconstructed. This time-dependent method results in a measured tunneling peak current density of ~ 1100 A/cm2. The nonlinear oscillations of the experimental circuit are reproduced by modeling an equivalent circuit, resulting in qualitative agreement with the observed oscillations. This model predicts the capacitance and inductance of the equivalent circuit to be approximately 3 nF and 3.5 μH, respectively. This numerical model can be used to determine the inductance and the capacitance of any circuit having a negative differential resistance region.

Relevant
Antireflection Coating Design for Triple-Junction III–V/Ge High-Efficiency Solar Cells Using Low Absorption PECVD Silicon Nitride

The design of antireflection coating (ARC) for multijunction solar cells is challenging due to the broadband absorption and the need for current matching of each subcell. Silicon nitride, which is deposited by plasma-enhanced chemical vapor deposition (PECVD) using standard conditions, is widely used in the silicon wafer solar cell industry but typically suffers from absorption in the short-wavelength range. We propose the use of silicon nitride deposited by low-frequency PECVD (LFSiN) optimized for high refractive index and low optical absorption as a part of the ARC design for III–V/Ge triple-junction solar cells. This material can also act as a passivation/encapsulation coating. Simulations show that the SiO <formula formulatype="inline" xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"><tex Notation="TeX">$_{{\rm 2}}$</tex> </formula> /LFSiN double-layer ARC can be very effective in reducing the reflection losses over the wavelength range of the limiting subcell for top subcell-limited, as well as middle subcell-limited, triple-junction solar cells. We also demonstrate that the structure’s performance is stable over expected variations in the layer parameters (thickness and refractive index) in the vicinity of the optimal values.

Relevant