Zn-vapor diffused Er:Yb:LiNbO 3 channel waveguides fabricated by means of SiO 2 electron cyclotron resonance plasma deposition

Abstract

We report here the fabrication method and operation of Zinc-vapor diffused channel waveguides on Erbium/Ytterbium (Er/Yb)-doped Lithium Niobate (LiNbO 3). electron cyclotron resonance (ECR) plasma deposition technique, UV photolithography and Reactive Ion Etching (RIE) are used to define an SiO 2 mask for pattern transfer. The whole process is performed at low temperatures eliminating typical LiO 2 out-diffusion problems and achieving low surface damage. The flexibility of the fabrication technology has been shown to be potentially applicable to integrated optics. EDAX measurements reveal good confinement and homogeneity of the diffused regions. Atomic Force Microscopy (AFM) surface characterization shows the swelling of the diffused areas, consistent with the topoepitaxial growth of a Zn x Li y Nb z O w layer.