Abstract
ZnS x Se 1− x ( x=0.08–0.12) substrates transparent for ZnSe QW emissions were used for the growth of ZnSe/ZnMgSSe structures. The FWHM of X-ray rocking curves of the substrates were 36–38 arcsec. Etching the substrate in diluted HCl to remove the oxide layer was performed as final treatment before the epitaxy. A variety of ZnSe/ZnMgSSe QW structures were grown by low-pressure MOVPE. All structures grown have strong ZnSe QW emissions in their PL spectra. For a MQW structure with intended well thicknesses of 4, 6 and 12 nm, well-resolved peaks of all QWs were observed.
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Disclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.