Abstract
ZnO nano films were deposited on p-Si(100) with different pre-deposited buffer layers by RF magnetron sputtering system under different processing conditions. The film surface morphology and crystal structure were characterized by scanning electron microscopy, atomic force microscopy, and X-ray diffraction. The results demonstrate that the grain sizes of ZnO films vary from 6-100 nm under different processing conditions. The film with the thickness about 300 nm was formed by ZnO nano-pillars dominantly orientated in c-axis direction. Moreover, the film surfaces are very smooth and homogeneous.
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