Abstract
Ellipsometry can be used to measure the thickness of Zircaloy oxide to 5 μm at a measuring wavelength of 3.39 μ to an accuracy of about 10%. If we assume that the extinction coefficient remains relatively constant between 3 and 10 μm wavelength, thicknesses of up to 15 μm should be measurable at the latter wavelength. In addition to thickness measurements, ellipsometry could be used effectively for in situ kinetic point-by-point studies of Zircaloy oxide film growth in closed systems involving a variety of experimental conditions so long as the ambient medium in the system allows reflection from the specimen. Automation of the ellipsometer would make it possible to measure rapid changes in film thickness.
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