Abstract
Yttrium 3-(4-nitrophenyl)-2-propenoate has been studied as an effective corrosion inhibitor for copper alloy in 0.1M chloride solution. The results show that the surface of copper alloy coupons exposed to solutions containing 0.45mM yttrium 3-(4-nitrophenyl)-2-propenoate had no signs of corrosion attack due to protective film formation, whereas the surface of copper alloy coupons exposed to non-inhibitor and lower concentrations of yttrium 3-(4-nitrophenyl)-2-propenoate containing solutions were severely corroded. A high inhibition performance is attributed to the forming protective inhibiting deposits that slow down the electrochemical corrosion reactions and mitigate corrosion by promoting random distribution of minor anodes.
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