Abstract

LELECUT type triple patterning lithography is one of the most promising techniques in the next generation lithography. To prevent yield loss caused by overlay error, LELECUT mask assignment which is tolerant to overlay error is desired. In this paper, we propose a method that obtains an LELECUT assignment which is tolerant to overlay error. The proposed method uses positive semide_nite relaxation and randomized rounding technique. In our method, the cost function that takes the length of boundary of features determined by the cut mask into account is introduced.

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