Abstract
By X-ray stress analysis technique, a new approach has been applied to determining the yield strength of polycrystalline TiN film with biaxial residual stress adherent to metal substrate. By plasma-assisted chemical vapor deposition (PACVD), TiN film was deposited on a strip of spring steel 60Mn allowing the film to be subjected to tensile stress under loading of the film/substrate. The film thickness is 2.5μm and the steel substrate thickness is 1.1mm. Longitudinal and transverse stresses, σ 1 and σ 2 of the film were measured in situ by X-ray diffraction. On the basis of the experimental results, the effective stress o and the effective uniaxial strain e t were obtained. According to the σ-e t relation, the calculated proof stresses, σ 0.1 , and σ 0.2 , of TiN film are 4.2GPa and 4.4GPa, respectively.
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
