Abstract
A MoSi2 coating with Y2O3 diffusion barrier was prepared on Nb-Si based alloy by electroplating of Y and then autoxidation of the Y film, followed by spark plasma sintering (SPS). With the addition of Y2O3 diffusion barrier, the outward diffusion of Nb, Ti and Cr was greatly suppressed and the inward consumption of Si element was reduced. After exposure of 500 h at 1250 °C, a dense SiO2 scale with a thickness of 5.5–6.7 µm formed on the coating and its mass gain was about 0.9 mg·cm−2.
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