Abstract
This paper describes work at Princeton on X-ray laser microscopy. Related to this work is a new system for the development of an X-ray laser in the wavelength region from 5 nm to 1 nm utilizing a Powerful Sub-Picosecond Laser (PP-Laser) of expected peak power up to 0.5 TW in a 300 fs pulse. Soft X-ray spectra generated by the interaction of the PP-Laser beam with different targets are presented and compared to the spectra generated by a much less intense laser beam (20-30 GW). The development of additional amplifiers for the recombining soft X-ray laser and the design of a cavity are presented from the point of view of applications for X-ray microscopy and microlithography.
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