Abstract

Bi 2O 3 films were prepared by reactive evaporation and by activated reactive evaporation. The various phases obtained were studied using X-ray diffraction. Reactive evaporation always produced β-Bi 2O 3 films. For a given substrate temperature, low rates of deposition (less than 20 Å s -1) always produced β-Bi 2O 3 films, whereas high rates of deposition (greater than 35 Å s -1) produced α-Bi 2O 3 films when the oxygen partial pressure inside the chamber was kept constant. Films prepared by both reactive evaporation and activated reactive evaporation at substrate temperatures below 400 K were amorphous in nature and at higher substrate temperatures polycrystalline films were produced. The results obtained on annealing these films in high vacuum and in air are also reported.

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