Abstract
Grazing incidence X-ray diffractometry (GIXD) and X-ray reflectometry (XR) have been introduced as well-suited tools for investigations of plasma deposited thin films as well as plasma exposed surface layers. These X-ray methods have a number of advantages compared to other commonly used techniques. A combination of GIXD and XR can give a range of interesting information about chemical, physical and crystallographic properties of thin films. Conclusions can be drawn how plasma deposition techniques and plasma parameters influence film formation and film growth. In this chapter the basic principles of GIXD and XR were introduced and the efficiency of these X-ray methods will be discussed. By means of examples the phase analysis of thin films will be presented, the influence of plasma parameters on film properties will be discussed as well as the defect structure analysis of plasma-deposited films and plasma chemical reactions in surface layers.
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