Abstract
A three-element condenser system has been designed and fabricated for use in a soft x-ray projection lithography facility at Lawrence Livermore National Laboratory. The design uses Kohler illumination to transport x-rays generated by a laser-produced plasma onto an x-ray reflection mask. The condenser optics are coated with molybdenum silicon multilayers to provide peak reflectance at an operating wavelength of approximately 13.0 nm.
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