Abstract

Alumina-supported mixed bimetallic Rh–V thin films, with the overall thickness of 0.8ML, were prepared under the ultrahigh vacuum (UHV) conditions and characterized with respect to their electronic and CO adsorption properties. X-ray photoelectron spectroscopy (XPS) was utilized to characterize electronic changes accompanying bimetallic Rh–V interaction and interaction between metal and polycrystalline γ-Al2O3 substrate. The chemisorption properties were probed by temperature-programmed desorption spectroscopy (TPD) of CO molecules. The electronic and chemisorption properties of the mixed layers were compared with pure Rh and V layers grown on the same γ-Al2O3 substrate and with a model bimetallic Rh–V system prepared by V deposition on a polycrystalline Rh foil. By varying the preparation conditions, we observed a strong dependence of the studied properties on the position of the V atoms. The presence of V atoms on the surface led to a fast deactivation, while vanadium presented under the surface resulted in a weakening of CO-metal surface bond, a change in the proportion of the adsorption side species, and an increase of CO dissociation.

Talk to us

Join us for a 30 min session where you can share your feedback and ask us any queries you have

Schedule a call

Disclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.