Abstract
The structure of the valence electron energy bands of TiN and (Ti, Al)N coatings in relation to their chemical composition and deposition parameters were studied by XPS and by EELS in the reflection mode. Coatings were deposited by reactive sputter ion plating using targets of pure Ti and 50 at% Ti-50 at% Al in a nitrogenargon atmosphere on high-speed steel (HSS) substrates. The composition of the resultant coatings was determined by quantitative AES analysis and sputter depth-profiling. The influence of target composition, nitrogen partial pressure, substrate temperature and bias potential during deposition on the electron densities and relative energy shifts of the occupied and unoccupied valence electron energy states (molecular orbitals derived from N(2p), O(2p), Ti(3d/4s) and Al(3p) electron states) was determined by XPS and EELS in a synergistic approach.
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