Abstract
The coefficient representing utilization of the electron beam energy (K ~2.3×10−3) in dissociation of XeF2 vapor was determined. This dissociation occurred under the action of selective radiation emitted from electron-beam-excited Xe2* dimers. Lasing was observed as a result of the C–A transition in the XeF* molecule (λ = 480 nm) and the output energy was 3.1 mJ.
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