X-ray standing wave technique with spatial resolution: In-plane characterization of surfaces and interfaces by full-field x-ray fluorescence imaging

Abstract

The present paper describes a powerful extension of the x-ray standing-wave technique that combines it with the capability of full-field x-ray fluorescence imaging, so that the impurity depth profiles at all different parts of a nanolayer material can be measured in parallel. The imaging capability improves the robustness and reliability of the x-ray standing-wave technique in investigating inhomogeneous two-dimensional materials and soft interfaces. It can also visualize the three-dimensional element-specific structure at a buried interface with a depth resolution at the nanometer level.