Abstract
Perfect crystal silicon samples implanted with 60 KeV Bi atoms along the [110] surface normal direction were analyzed with X-ray standing waves. Two reflection orders, (220) and (440) were used with synchrontron radiation to study systematically the impurity distribution function at 5 different doses ranging from 0.6 to 10×1014 Bi atoms/cm2. The analysis reveals the substitutional Bi position connected with a lattice expansion and the formation of precipitates at higher Bi doses as well as estimates for the Bi vibrational amplitude.
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