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Abstract
Abstract The annealing effects on thin Cr layers deposited by rf sputtering are investigated by X-ray reflectivity and glancing-incidence diffraction. It is shown that annealing induces a phase segregation which dramatically changes the features of the X-ray reflectivity pattern. This study allows us to present and discuss the main features of X-ray reflectivity, which make it a powerful tool for the non-destructive analysis of thin single layers or multilayers and interfaces.
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