Abstract
Depending on preparation conditions, Fe silicides grown on Si(111) by means of solid phase epitaxy and molecular beam epitaxy show the formation of the bulk ε-FeSi and β-FeSi2 phases as well as epitaxially grown metastable CsCl- and CaF2-type Fe silicides. The valence-band of these Fe silicides are measured with monochromatized Al Kα x-ray photoemission and angle resolved ultraviolet photoemission and are found to be in remarkable agreement with calculated densities of states.
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