Abstract
AbstractWe have studied the growth and thermal stability of Pd ultra‐thin films on Al2O3/NiAl(110) in situ using x‐ray photoelectron spectroscopy. The results showed that Pd grew in a nearly layer‐by‐layer manner on the Al2O3/NiAl (110) surface at a deposition rate of 0.2 Å/min. No strong interaction between the Pd over‐layer and the substrate was observed during initial growth. After high‐temperature treatments, Pd diffused into the substrate and the alumina layer thickness increased significantly. Palladium served as a catalyst for this reaction when the temperature was lower than 570 K; PdO formed when the temperature was higher than 670 K. Copyright © 2004 John Wiley & Sons, Ltd.
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