Abstract
The Center for Advanced Microstructures and Devices (CAMD) has established infrastructure and experience for deep X-ray lithography and functions as a print-shop for high aspect ratio microstructures in the US. A major up-grade of the facility will be completed by the end of 1997. It includes the installation of a wavelength shifter as a hard X-ray source for ultra-deep X-ray lithography and for cost effective, batch fabrication of high aspect ratio micro-components. This paper describes the X-ray micromachining facility and programs at CAMD. The scientific and engineering activities exemplified by results of current studies are reported.
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