X-ray diffraction study of the effect of annealing temperature on the phase and structural states of Fe79Zr10N11 films produced by magnetron sputtering

Abstract

Fe79Zr10N11 films 0.7 μm thick deposited on glass substrates have been produced by rf reactive magnetron sputtering. The films are a soft magnetic material, which can exhibit a combination of a high saturation inductance and a low coercive force and, therefore, shows promise as magnetic recording cores for the high-density magnetic recording. The results of X-ray diffraction studies of the phase and structural states of the films and the effect of annealing on these states are considered.