Abstract
Silicon dioxide lamellar gratings fabricated by a new technique combining holographic exposure and reactive ion-beam etching are found experimentally to be appropriate to and useful for synchrotron radiation spectroscopy. Methods to improve edge roughness and to control the land-to-groove width ratio are also investigated. The fabrication technique developed here is relatively simple in comparison with the ruling technique which needs delicate control. Therefore, it is a promising way to employ these bakable original gratings for synchrotron radiation spectroscopy.
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