Abstract
The microstructure and composition of reactively sputtered, molybdenum oxide thin films are found to be especially sensitive to the working gas pressure and flow conditions. The variations in composition and crystallographic texture of nominal Mo 2O 3 films are studied, as formed at low pressure (less than 5 mTorr) and flow (less than 25 cm 3 min −1) conditions, using Auger electron spectroscopy and X-ray diffraction. The structure and composition of the Mo 2O 3 films are categorized as part of a continuous series of molybdenum oxide compounds based on a body centered tetragonal unit cell.
Full Text 
Sign-in/Register to access full text options
Sign-in/Register to access full text options 
Published version (
Free)
Free) 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a call
