Abstract
Highly conformal and stable WN film was fabricated by atomic layer deposition method (ALD) using BTBMW (bis(tert- butylimido)-bis-(dimethylamido)tungsten, C12H30N4W) and NH3, and deposition temperature was 360{degree sign}C. Amorphous phase was maintained up to 700{degree sign}C after rapid thermal annealing (RTA). To improve diffusion barrier property, NH3 plasma treatment was done at the nucleation step or after film deposition. Surface morphology, film density and diffusion barrier property of the film were improved by NH3 plasma treatment at the nucleation step, and also aging effect of the sheet resistance were removed by NH3 post treatment.
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