Abstract
The paper proposes a technology based on UV-LIGA process for microoptoelectromechanical systems (MOEMS) manufacturing. We used the original combination of materials and technological steps, in which any of the materials does not enter chemical reactions with each other, while all of them are weakly sensitive to the effects of oxygen plasma. This made it suitable for long-term etching in the oxygen plasma at low discharge power with the complete preservation of the original geometry, including small parts. The micromembranes were formed by thermal evaporation of Al. This simplified the technique compared to the classic UV-LIGA and guaranteed high quality and uniformity of the resulting structure. To demonstrate the complete process, a test MOEMS with electrostatic control was manufactured. On one chip, a set of micromembranes was created with different stiffness from 10 nm/V to 100 nm/V and various working ranges from 100 to 300 nm. All membranes have a flat frequency response without resonant peaks in the frequency range 0–200 kHz. The proposed technology potentially enables the manufacture of wide low-height membranes of complex geometry to create microoptic fiber sensors.
Highlights
The paper proposes a modification of the UV-LIGA technology, which enables the obtaining of wide membranes of various geometries
An original technological route for the fabrication of the simultaneously low-height and wide structures was developed. This enables the expansion of the range of possible geometries and resulting parameters of the structures you create
Long-term etching in the oxygen plasma at low discharge power was considered to be the main method of the final removal of the resist, since liquid etching is not very suitable for such geometries
Summary
The characteristic dimensions of sensitive elements in such systems are 10–100 μm It enables the effective integration of them with an optical fiber and obtain sensors of small sizes. The LIGA technology (German acronym for Lithographie, Galvanoformung, Abformung (Lithography, Electroplating, and Molding)) [23,24,25,26,27,28], has acquired great attention It is based on a sequence of lithography, electroplating and microforming processes that enable the creation of 3D elements with vertical sides and small lateral dimensions. The modification of the LIGA-UV-LIGA technology [32,33,34,35] has a great popularity In this technique instead of the X-ray lithography, the ultraviolet (UV) is used. To demonstrate the proposed technology, a matrix of test membranes with electrostatic control and optical readability with flat frequency response in a wide frequency range was created
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